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- 350_nanometer abstract "The 350 nanometer (350 nm) process refers to the level of semiconductor process technology that was reached in the 1995–1996 timeframe, by most leading semiconductor companies, like Intel and IBM.".
- 350_nanometer wikiPageID "9769974".
- 350_nanometer wikiPageRevisionID "545289547".
- 350_nanometer hasPhotoCollection 350_nanometer.
- 350_nanometer list "CMOS manufacturing processes".
- 350_nanometer next "250.0".
- 350_nanometer prev "600.0".
- 350_nanometer subject Category:1995_introductions.
- 350_nanometer subject Category:International_Technology_Roadmap_for_Semiconductors_lithography_nodes.
- 350_nanometer comment "The 350 nanometer (350 nm) process refers to the level of semiconductor process technology that was reached in the 1995–1996 timeframe, by most leading semiconductor companies, like Intel and IBM.".
- 350_nanometer label "350 nanometer".
- 350_nanometer label "350 nanómetros".
- 350_nanometer label "350 nm".
- 350_nanometer label "عملية 350 نانومتر".
- 350_nanometer sameAs 350_nanómetros.
- 350_nanometer sameAs 350_nm.
- 350_nanometer sameAs 350_nm_공정.
- 350_nanometer sameAs m.02prp1k.
- 350_nanometer sameAs Q1050761.
- 350_nanometer sameAs Q1050761.
- 350_nanometer wasDerivedFrom 350_nanometer?oldid=545289547.
- 350_nanometer isPrimaryTopicOf 350_nanometer.