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- Atomic_layer_deposition abstract "Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with a surface one at a time in a sequential, self-limiting, manner. By exposing the precursors to the growth surface repeatedly, a thin film is deposited.".
- Atomic_layer_deposition wikiPageExternalLink J_Phys_Chem_100.pdf.
- Atomic_layer_deposition wikiPageExternalLink p050801_s1.
- Atomic_layer_deposition wikiPageExternalLink p01A133_s1.
- Atomic_layer_deposition wikiPageExternalLink winter.
- Atomic_layer_deposition wikiPageExternalLink P66.abstract?sid=5799daa8-334d-4c05-bec1-0408a7b7d104.
- Atomic_layer_deposition wikiPageExternalLink 1.
- Atomic_layer_deposition wikiPageExternalLink urn:nbn:de:bsz:ch1-qucosa-68040.
- Atomic_layer_deposition wikiPageExternalLink pmp.
- Atomic_layer_deposition wikiPageExternalLink www.ald-avs.org.
- Atomic_layer_deposition wikiPageExternalLink www.aldpulse.com.
- Atomic_layer_deposition wikiPageExternalLink www.beneq.com.
- Atomic_layer_deposition wikiPageExternalLink www.cambridgenanotech.com.
- Atomic_layer_deposition wikiPageExternalLink gordon.
- Atomic_layer_deposition wikiPageExternalLink profile_willis_brian.html.
- Atomic_layer_deposition wikiPageExternalLink ald-lab-dresden.html.
- Atomic_layer_deposition wikiPageExternalLink georges.html.
- Atomic_layer_deposition wikiPageExternalLink atomlagenabscheidungald.html.
- Atomic_layer_deposition wikiPageExternalLink www.encapsulix.com.
- Atomic_layer_deposition wikiPageExternalLink ALD_with_copyright.gif.
- Atomic_layer_deposition wikiPageExternalLink groups?gid=1885076&trk=my_groups-b-grp-v.
- Atomic_layer_deposition wikiPageExternalLink www.max-sci.com.
- Atomic_layer_deposition wikiPageExternalLink chipworks.html.
- Atomic_layer_deposition wikiPageExternalLink home.aspx.
- Atomic_layer_deposition wikiPageExternalLink ALD2008.
- Atomic_layer_deposition wikiPageExternalLink www.picosun.com.
- Atomic_layer_deposition wikiPageExternalLink www.sentech.de.
- Atomic_layer_deposition wikiPageExternalLink watch?v=9p2wwOTpCCI.
- Atomic_layer_deposition wikiPageID "3607910".
- Atomic_layer_deposition wikiPageRevisionID "598780518".
- Atomic_layer_deposition hasPhotoCollection Atomic_layer_deposition.
- Atomic_layer_deposition subject Category:Chemical_processes.
- Atomic_layer_deposition subject Category:Thin_film_deposition.
- Atomic_layer_deposition type ChemicalProcess113446390.
- Atomic_layer_deposition type ChemicalProcesses.
- Atomic_layer_deposition type NaturalProcess113518963.
- Atomic_layer_deposition type PhysicalEntity100001930.
- Atomic_layer_deposition type Process100029677.
- Atomic_layer_deposition comment "Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with a surface one at a time in a sequential, self-limiting, manner. By exposing the precursors to the growth surface repeatedly, a thin film is deposited.".
- Atomic_layer_deposition label "Atomic Layer Deposition".
- Atomic_layer_deposition label "Atomic layer deposition".
- Atomic_layer_deposition label "Atomlagenabscheidung".
- Atomic_layer_deposition label "Атомно-слоевое осаждение".
- Atomic_layer_deposition label "原子层沉积".
- Atomic_layer_deposition sameAs Atomlagenabscheidung.
- Atomic_layer_deposition sameAs Atomic_Layer_Deposition.
- Atomic_layer_deposition sameAs m.09pmhb.
- Atomic_layer_deposition sameAs Q757625.
- Atomic_layer_deposition sameAs Q757625.
- Atomic_layer_deposition sameAs Atomic_layer_deposition.
- Atomic_layer_deposition wasDerivedFrom Atomic_layer_deposition?oldid=598780518.
- Atomic_layer_deposition isPrimaryTopicOf Atomic_layer_deposition.