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- Chemical_vapor_deposition abstract "Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon, carbon fiber, carbon nanofibers, filaments, carbon nanotubes, SiO2, silicon-germanium, tungsten, silicon carbide, silicon nitride, silicon oxynitride, titanium nitride, and various high-k dielectrics. CVD is also used to produce synthetic diamonds.".
- Chemical_vapor_deposition thumbnail PICT0111.JPG?width=300.
- Chemical_vapor_deposition wikiPageExternalLink j.stam.2007.08.008.
- Chemical_vapor_deposition wikiPageExternalLink 035013.
- Chemical_vapor_deposition wikiPageExternalLink coating.
- Chemical_vapor_deposition wikiPageExternalLink cvd_diamond_booklet.pdf.
- Chemical_vapor_deposition wikiPageExternalLink page=74.
- Chemical_vapor_deposition wikiPageExternalLink ccvd.html.
- Chemical_vapor_deposition wikiPageExternalLink Fundamentals_of_CVD.html.
- Chemical_vapor_deposition wikiPageID "6111".
- Chemical_vapor_deposition wikiPageRevisionID "603140635".
- Chemical_vapor_deposition hasPhotoCollection Chemical_vapor_deposition.
- Chemical_vapor_deposition subject Category:Chemical_processes.
- Chemical_vapor_deposition subject Category:Coatings.
- Chemical_vapor_deposition subject Category:Glass_coating_and_surface_modification.
- Chemical_vapor_deposition subject Category:Industrial_processes.
- Chemical_vapor_deposition subject Category:Plasma_processing.
- Chemical_vapor_deposition subject Category:Semiconductor_device_fabrication.
- Chemical_vapor_deposition subject Category:Synthetic_diamond.
- Chemical_vapor_deposition subject Category:Thin_film_deposition.
- Chemical_vapor_deposition subject Category:Vacuum.
- Chemical_vapor_deposition type ChemicalProcess113446390.
- Chemical_vapor_deposition type ChemicalProcesses.
- Chemical_vapor_deposition type IndustrialProcess113497928.
- Chemical_vapor_deposition type IndustrialProcesses.
- Chemical_vapor_deposition type NaturalProcess113518963.
- Chemical_vapor_deposition type PhysicalEntity100001930.
- Chemical_vapor_deposition type Process100029677.
- Chemical_vapor_deposition comment "Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit.".
- Chemical_vapor_deposition label "Chemical vapor deposition".
- Chemical_vapor_deposition label "Chemical vapor deposition".
- Chemical_vapor_deposition label "Chemiczne osadzanie z fazy gazowej".
- Chemical_vapor_deposition label "Chemische Gasphasenabscheidung".
- Chemical_vapor_deposition label "Deposición química de vapor".
- Chemical_vapor_deposition label "Deposizione chimica da vapore".
- Chemical_vapor_deposition label "Deposição química em fase vapor".
- Chemical_vapor_deposition label "Dépôt chimique en phase vapeur".
- Chemical_vapor_deposition label "Химическое осаждение из газовой фазы".
- Chemical_vapor_deposition label "ترسيب كيميائي للبخار".
- Chemical_vapor_deposition label "化学气相沉积".
- Chemical_vapor_deposition label "化学気相成長".
- Chemical_vapor_deposition sameAs Chemická_depozice_z_plynné_fáze.
- Chemical_vapor_deposition sameAs Chemische_Gasphasenabscheidung.
- Chemical_vapor_deposition sameAs Deposición_química_de_vapor.
- Chemical_vapor_deposition sameAs Dépôt_chimique_en_phase_vapeur.
- Chemical_vapor_deposition sameAs Pengendapan_uap_kimia.
- Chemical_vapor_deposition sameAs Deposizione_chimica_da_vapore.
- Chemical_vapor_deposition sameAs 化学気相成長.
- Chemical_vapor_deposition sameAs 화학기상증착.
- Chemical_vapor_deposition sameAs Chemical_vapor_deposition.
- Chemical_vapor_deposition sameAs Chemiczne_osadzanie_z_fazy_gazowej.
- Chemical_vapor_deposition sameAs Deposição_química_em_fase_vapor.
- Chemical_vapor_deposition sameAs m.01tw9.
- Chemical_vapor_deposition sameAs Q505668.
- Chemical_vapor_deposition sameAs Q505668.
- Chemical_vapor_deposition sameAs Chemical_vapor_deposition.
- Chemical_vapor_deposition wasDerivedFrom Chemical_vapor_deposition?oldid=603140635.
- Chemical_vapor_deposition depiction PICT0111.JPG.
- Chemical_vapor_deposition isPrimaryTopicOf Chemical_vapor_deposition.