Matches in DBpedia 2014 for { <http://dbpedia.org/resource/Plasma_etching> ?p ?o. }
Showing items 1 to 17 of
17
with 100 items per page.
- Plasma_etching abstract "Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma will generate volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.".
- Plasma_etching wikiPageExternalLink 6209x1699.pdf.
- Plasma_etching wikiPageExternalLink plasmaetchfundam.html.
- Plasma_etching wikiPageID "4231961".
- Plasma_etching wikiPageRevisionID "545434155".
- Plasma_etching hasPhotoCollection Plasma_etching.
- Plasma_etching subject Category:Plasma_processing.
- Plasma_etching subject Category:Semiconductor_device_fabrication.
- Plasma_etching comment "Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals).".
- Plasma_etching label "Gravure au plasma".
- Plasma_etching label "Plasma etching".
- Plasma_etching sameAs Gravure_au_plasma.
- Plasma_etching sameAs m.0br8w3.
- Plasma_etching sameAs Q2392011.
- Plasma_etching sameAs Q2392011.
- Plasma_etching wasDerivedFrom Plasma_etching?oldid=545434155.
- Plasma_etching isPrimaryTopicOf Plasma_etching.