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- Reactive-ion_etching abstract "Reactive-ion etching (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.".
- Reactive-ion_etching thumbnail Reactive_Ion_Etcher.JPG?width=300.
- Reactive-ion_etching wikiPageExternalLink rie.html.
- Reactive-ion_etching wikiPageExternalLink plasmaetchfundam.html.
- Reactive-ion_etching wikiPageExternalLink rie_etching.phtml.
- Reactive-ion_etching wikiPageExternalLink sibo_1.htm.
- Reactive-ion_etching wikiPageID "751638".
- Reactive-ion_etching wikiPageRevisionID "578774219".
- Reactive-ion_etching hasPhotoCollection Reactive-ion_etching.
- Reactive-ion_etching subject Category:Etching_(microfabrication).
- Reactive-ion_etching subject Category:Plasma_processing.
- Reactive-ion_etching subject Category:Semiconductor_device_fabrication.
- Reactive-ion_etching comment "Reactive-ion etching (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.".
- Reactive-ion_etching label "Gravure ionique réactive".
- Reactive-ion_etching label "Plasmaätzen".
- Reactive-ion_etching label "Reactive-ion etching".
- Reactive-ion_etching label "反应离子刻蚀".
- Reactive-ion_etching label "反応性イオンエッチング".
- Reactive-ion_etching sameAs Plasmaätzen.
- Reactive-ion_etching sameAs Gravure_ionique_réactive.
- Reactive-ion_etching sameAs 反応性イオンエッチング.
- Reactive-ion_etching sameAs m.03895x.
- Reactive-ion_etching sameAs Q1640159.
- Reactive-ion_etching sameAs Q1640159.
- Reactive-ion_etching wasDerivedFrom Reactive-ion_etching?oldid=578774219.
- Reactive-ion_etching depiction Reactive_Ion_Etcher.JPG.
- Reactive-ion_etching isPrimaryTopicOf Reactive-ion_etching.