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- Resputtering abstract "Resputtering involves re-emission of material, e.g., SiO2, deposited by sputtering during the deposition. Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I. Maissel et al. in the Journal of Applied Physics (Jan. 1965, p. 237) and was called Biased Sputtering.".
- Resputtering wikiPageID "13272023".
- Resputtering wikiPageRevisionID "408768130".
- Resputtering hasPhotoCollection Resputtering.
- Resputtering subject Category:Coatings.
- Resputtering type Artifact100021939.
- Resputtering type Coating103058107.
- Resputtering type Coatings.
- Resputtering type Covering103122748.
- Resputtering type Object100002684.
- Resputtering type PhysicalEntity100001930.
- Resputtering type Whole100003553.
- Resputtering comment "Resputtering involves re-emission of material, e.g., SiO2, deposited by sputtering during the deposition. Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I. Maissel et al. in the Journal of Applied Physics (Jan. 1965, p. 237) and was called Biased Sputtering.".
- Resputtering label "Resputtering".
- Resputtering sameAs m.03c0181.
- Resputtering sameAs Q16893508.
- Resputtering sameAs Q16893508.
- Resputtering sameAs Resputtering.
- Resputtering wasDerivedFrom Resputtering?oldid=408768130.
- Resputtering isPrimaryTopicOf Resputtering.