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- 2003271753 contributor B9585829.
- 2003271753 contributor B9585830.
- 2003271753 created "2003.".
- 2003271753 date "2003".
- 2003271753 date "2003.".
- 2003271753 dateCopyrighted "2003.".
- 2003271753 extent "x, 150 p. :".
- 2003271753 identifier "0444513396".
- 2003271753 identifier 2003271753-d.html.
- 2003271753 issued "2003".
- 2003271753 issued "2003.".
- 2003271753 language "eng".
- 2003271753 publisher "Amsterdam : London : Elsevier,".
- 2003271753 subject "621.3815/2 22".
- 2003271753 subject "Rapid thermal processing Congresses.".
- 2003271753 subject "Semiconductors Heat treatment Congresses.".
- 2003271753 subject "TK7871.85 .I57665 2001".
- 2003271753 title "Rapid thermal processing for future semiconductor devices : proceedings of the 2001 International Conference on Rapid Thermal Processing for Future Semiconductor Devices (RTP 2001), held at Ise-Shima, Mie, Japan, November 14-16, 2001 / edited by Hisashi Fukuda.".
- 2003271753 type "text".