Matches in Library of Congress for { <http://lccn.loc.gov/2007281758> ?p ?o. }
Showing items 1 to 26 of
26
with 100 items per page.
- 2007281758 alternative "Photomask and X-ray mask technology".
- 2007281758 contributor B10828434.
- 2007281758 contributor B10828435.
- 2007281758 created "c2007.".
- 2007281758 date "2007".
- 2007281758 date "c2007.".
- 2007281758 dateCopyrighted "c2007.".
- 2007281758 description "Includes bibliographical references and author index.".
- 2007281758 extent "2 v. :".
- 2007281758 identifier "0819467456 (pbk.)".
- 2007281758 identifier "9780819467454 (pbk.)".
- 2007281758 isPartOf "Proceedings of SPIE, 0277-786X ; 6607".
- 2007281758 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6607.".
- 2007281758 issued "2007".
- 2007281758 issued "c2007.".
- 2007281758 language "eng".
- 2007281758 publisher "Bellingham, Wash. : SPIE,".
- 2007281758 subject "621.3815/31 22".
- 2007281758 subject "Integrated circuits Masks Congresses.".
- 2007281758 subject "Masks (Electronics) Congresses.".
- 2007281758 subject "Microlithography Congresses.".
- 2007281758 subject "Optoelectronic devices Design and construction Congresses.".
- 2007281758 subject "TK7872.M3 P4626 2007".
- 2007281758 subject "X-ray lithography Congresses.".
- 2007281758 title "Photomask and next-generation lithography mask technology XIV : 17-19 April 2007, Yokohama, Japan / Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.".
- 2007281758 type "text".