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- 2007940880 contributor B11068644.
- 2007940880 contributor B11068645.
- 2007940880 created "2008.".
- 2007940880 date "2008".
- 2007940880 date "2008.".
- 2007940880 dateCopyrighted "2008.".
- 2007940880 description "Includes bibliographical references (p. [191]-200) and index.".
- 2007940880 extent "xi, 204 p. :".
- 2007940880 identifier "0387751084 (hbk.)".
- 2007940880 identifier "9780387751085 (hbk.)".
- 2007940880 isPartOf "Springer series in materials science ; v. 108".
- 2007940880 issued "2008".
- 2007940880 issued "2008.".
- 2007940880 language "eng".
- 2007940880 publisher "New York ; London : Springer,".
- 2007940880 subject "621.38152 22".
- 2007940880 subject "Chemical vapor deposition.".
- 2007940880 subject "TK7872.T55 P45 2008".
- 2007940880 subject "Thin film devices.".
- 2007940880 subject "Thin films Mathematical models.".
- 2007940880 subject "Thin films Microstructure.".
- 2007940880 title "Evolution of thin film morphology : modeling and simulations / Matthew Pelliccione and Toh-Ming Lu.".
- 2007940880 type "text".