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- 2010459382 alternative "EMLC 2009".
- 2010459382 alternative "European Mask and Lithography Conference 2009".
- 2010459382 alternative "Twenty-fifth European Mask and Lithography Conference".
- 2010459382 contributor B11965388.
- 2010459382 contributor B11965389.
- 2010459382 contributor B11965390.
- 2010459382 created "c2009.".
- 2010459382 date "2009".
- 2010459382 date "c2009.".
- 2010459382 dateCopyrighted "c2009.".
- 2010459382 description "Includes bibliographical references and author index.".
- 2010459382 extent "1 v. (various pagings) :".
- 2010459382 identifier "0819477702".
- 2010459382 identifier "9780819477705".
- 2010459382 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7470".
- 2010459382 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 7470.".
- 2010459382 issued "2009".
- 2010459382 issued "c2009.".
- 2010459382 language "eng".
- 2010459382 publisher "Bellingham, Wash., : SPIE,".
- 2010459382 subject "621.3815".
- 2010459382 subject "Integrated circuits Masks Congresses.".
- 2010459382 subject "Microlithography Congresses.".
- 2010459382 subject "TK7872.M3 E98 2009".
- 2010459382 title "25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany / Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.].".
- 2010459382 title "EMLC 2009".
- 2010459382 title "European Mask and Lithography Conference 2009".
- 2010459382 title "Twenty-fifth European Mask and Lithography Conference".
- 2010459382 type "text".