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- 91202510 contributor B6530499.
- 91202510 created "1991.".
- 91202510 date "1991".
- 91202510 date "1991.".
- 91202510 dateCopyrighted "1991.".
- 91202510 description "Includes bibliographical references.".
- 91202510 extent "x, 159 p. :".
- 91202510 identifier "0387539549 (U.S.)".
- 91202510 isPartOf "Research reports ESPRIT. Project 369 ; vol. 1".
- 91202510 issued "1991".
- 91202510 issued "1991.".
- 91202510 language "eng".
- 91202510 publisher "Berlin ; New York : Springer-Verlag,".
- 91202510 subject "621.381/52 20".
- 91202510 subject "Integrated circuits Very large scale integration Materials.".
- 91202510 subject "Metal oxide semiconductors, Complementary.".
- 91202510 subject "Silicon nitride.".
- 91202510 subject "TK7872.T55 L63 1991".
- 91202510 subject "Thin film devices.".
- 91202510 title "LPCVD silicon nitride and oxynitride films : material and applications in integrated circuit technology / F.H.P.M. Habraken (ed.).".
- 91202510 type "text".