Matches in UGent Biblio for { <https://biblio.ugent.be/publication/1964334#aggregation> ?p ?o. }
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- aggregation classification "C1".
- aggregation creator B73233.
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- aggregation creator B73235.
- aggregation creator B73236.
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- aggregation creator person.
- aggregation creator person.
- aggregation date "2011".
- aggregation format "application/pdf".
- aggregation hasFormat 1964334.bibtex.
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- aggregation isPartOf urn:isbn:9781424483389.
- aggregation isPartOf urn:isbn:9781424483396.
- aggregation isPartOf urn:isbn:9781424483402.
- aggregation language "eng".
- aggregation publisher "IEEE".
- aggregation rights "I have transferred the copyright for this publication to the publisher".
- aggregation subject "Technology and Engineering".
- aggregation title "SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device".
- aggregation abstract "We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the thickness uniformity by 50%. The effect of the correction process on the propagation loss and device uniformity is also presented.".
- aggregation authorList BK186618.
- aggregation endPage "73".
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- aggregation aggregates 1964337.
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- aggregation similarTo GROUP4.2011.6053719.
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