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- Etch_pit_density abstract "The etch pit density (EPD) is a measure for the quality of semiconductor wafers. An etch solution is applied on the surface of the wafer where the etch rate is increased at dislocations of the crystal resulting in pits. For GaAs one uses typically molten KOH at 450 degrees Celsius for about 40 minutes in a zirconium crucible. The density of the pits can be determined by optical contrast microscopy. Silicon wafers have usually a very low density of < 100 cm−2 while semi-insulating GaAs wafers have a density on the order of 105 cm−2. High-purity Germanium detectors require the Ge crystals to be grown with a controlled range of dislocation density to reduce impurities. The etch pitch density requirement is typically within the range 103 to 104 cm−2. The etch pit density can be determined according to DIN 50454-1 and ASTM F 1404.".
- Etch_pit_density wikiPageID "2927563".
- Etch_pit_density wikiPageRevisionID "546990058".
- Etch_pit_density hasPhotoCollection Etch_pit_density.
- Etch_pit_density subject Category:Semiconductors.
- Etch_pit_density type Abstraction100002137.
- Etch_pit_density type Conductor114821043.
- Etch_pit_density type Material114580897.
- Etch_pit_density type Matter100020827.
- Etch_pit_density type Part113809207.
- Etch_pit_density type PhysicalEntity100001930.
- Etch_pit_density type Relation100031921.
- Etch_pit_density type Semiconductor114821248.
- Etch_pit_density type Semiconductors.
- Etch_pit_density type Substance100019613.
- Etch_pit_density comment "The etch pit density (EPD) is a measure for the quality of semiconductor wafers. An etch solution is applied on the surface of the wafer where the etch rate is increased at dislocations of the crystal resulting in pits. For GaAs one uses typically molten KOH at 450 degrees Celsius for about 40 minutes in a zirconium crucible. The density of the pits can be determined by optical contrast microscopy.".
- Etch_pit_density label "Etch pit density".
- Etch_pit_density label "Versetzungsdichte".
- Etch_pit_density sameAs Versetzungsdichte.
- Etch_pit_density sameAs 에치_피트_밀도.
- Etch_pit_density sameAs m.08d6d4.
- Etch_pit_density sameAs Q2518122.
- Etch_pit_density sameAs Q2518122.
- Etch_pit_density sameAs Etch_pit_density.
- Etch_pit_density wasDerivedFrom Etch_pit_density?oldid=546990058.
- Etch_pit_density isPrimaryTopicOf Etch_pit_density.