Matches in DBpedia 2014 for { <http://dbpedia.org/resource/Front_end_of_line> ?p ?o. }
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- Front_end_of_line abstract "The front-end-of-line (FEOL) is the first portion of IC fabrication where the individual devices (transistors, capacitors, resistors, etc.) are patterned in the semiconductor. FEOL generally covers everything up to (but not including) the deposition of metal interconnect layers.FEOL contains all processes of CMOS fabrication needed to form fully isolated CMOS elements: Selecting the type of wafer to be used; Chemical-mechanical planarization and cleaning of the wafer. Shallow trench isolation (STI) (or LOCOS in early processes, with feature size > 0.25 μm) Well formation Gate module formation Source and drain module formation↑".
- Front_end_of_line wikiPageExternalLink books?id=kxYhNrOKuJQC&pg=PA177&dq=FEOL.
- Front_end_of_line wikiPageID "2877563".
- Front_end_of_line wikiPageRevisionID "578215120".
- Front_end_of_line hasPhotoCollection Front_end_of_line.
- Front_end_of_line subject Category:Electronics_manufacturing.
- Front_end_of_line subject Category:Semiconductor_device_fabrication.
- Front_end_of_line comment "The front-end-of-line (FEOL) is the first portion of IC fabrication where the individual devices (transistors, capacitors, resistors, etc.) are patterned in the semiconductor. FEOL generally covers everything up to (but not including) the deposition of metal interconnect layers.FEOL contains all processes of CMOS fabrication needed to form fully isolated CMOS elements: Selecting the type of wafer to be used; Chemical-mechanical planarization and cleaning of the wafer.".
- Front_end_of_line label "Front end of line".
- Front_end_of_line sameAs m.088l15.
- Front_end_of_line sameAs Q5505856.
- Front_end_of_line sameAs Q5505856.
- Front_end_of_line wasDerivedFrom Front_end_of_line?oldid=578215120.
- Front_end_of_line isPrimaryTopicOf Front_end_of_line.