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- Plasma_cleaning abstract "Plasma cleaning involves the removal of impurities and contaminants from surfaces through the use of an energetic plasma or Dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used. The plasma is created by using high frequency voltages (typically kHz to >MHz) to ionise the low pressure gas (typically around 1/1000 atmospheric pressure), although atmospheric pressure plasmas are now also common.".
- Plasma_cleaning thumbnail Oxygen_Plasma_Cleaning.JPG?width=300.
- Plasma_cleaning wikiPageID "5177225".
- Plasma_cleaning wikiPageRevisionID "590144907".
- Plasma_cleaning hasPhotoCollection Plasma_cleaning.
- Plasma_cleaning subject Category:Plasma_processing.
- Plasma_cleaning subject Category:Semiconductor_device_fabrication.
- Plasma_cleaning comment "Plasma cleaning involves the removal of impurities and contaminants from surfaces through the use of an energetic plasma or Dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used.".
- Plasma_cleaning label "Plasma cleaning".
- Plasma_cleaning sameAs m.0d6djb.
- Plasma_cleaning sameAs Q7201768.
- Plasma_cleaning sameAs Q7201768.
- Plasma_cleaning wasDerivedFrom Plasma_cleaning?oldid=590144907.
- Plasma_cleaning depiction Oxygen_Plasma_Cleaning.JPG.
- Plasma_cleaning isPrimaryTopicOf Plasma_cleaning.
