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- Resist abstract "In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.".
- Resist wikiPageExternalLink clariant.com.
- Resist wikiPageExternalLink electronicmaterials.rohmhaas.com.
- Resist wikiPageExternalLink microchem.com.
- Resist wikiPageID "2277564".
- Resist wikiPageRevisionID "570311218".
- Resist hasPhotoCollection Resist.
- Resist subject Category:Semiconductor_device_fabrication.
- Resist comment "In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution.".
- Resist label "Resist".
- Resist label "レジスト".
- Resist sameAs レジスト.
- Resist sameAs m.0708hf.
- Resist sameAs Q11349590.
- Resist sameAs Q11349590.
- Resist wasDerivedFrom Resist?oldid=570311218.
- Resist isPrimaryTopicOf Resist.