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- catalog contributor b291903.
- catalog contributor b291904.
- catalog created "c1983.".
- catalog date "1983".
- catalog date "c1983.".
- catalog dateCopyrighted "c1983.".
- catalog description "Includes bibliographical references and index.".
- catalog extent "viii, 242 p. :".
- catalog identifier "0892524286 (pbk.)".
- catalog isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 393".
- catalog issued "1983".
- catalog issued "c1983.".
- catalog language "eng".
- catalog publisher "Bellingham, Wash., USA : SPIE,".
- catalog subject "Ion beam lithography Congresses.".
- catalog subject "Lithography, Electron beam Congresses.".
- catalog subject "X-ray lithography Congresses.".
- catalog title "Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.".
- catalog type "text".