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- catalog contributor b1006084.
- catalog contributor b1006085.
- catalog contributor b1006086.
- catalog created "c1978.".
- catalog date "1978".
- catalog date "c1978.".
- catalog dateCopyrighted "c1978.".
- catalog description "An overview / J. M. Poate, K. N. Tu, J. W. Mayer -- Effect of thin film interactions on silicon device technology / R. Rosenberg, M. J. Sullivan, J. K. Howard -- Chemistry and physics of solid-solid interfaces / J. C. Phillips -- The semiconductor-conductor interface / J. O. McCaldin, T. C. McGill -- Thin film deposition and characterization / K. N. Tu, S. S. Lau -- Depth profiling techniques / J. W. Mayer, J. M. Poate -- Grain boundary diffusion / D. Gupta, D. R. Campbell, P. S. Ho -- Electromigration in thin films / F. M. d'Heurle, P. S. Ho -- Metal-metal interdiffusion / J. E. E. Baglin, J. M. Poate -- Silicide formation / K. N. Tu, J. W. Mayer -- Metal-compound semiconductor reactions / A. K. Sinha, J. M. Poate -- Solid phase epitaxy / S. S. Lau, W. F. van der Weg -- Effect of interfacial reactions on the electrical characteristics metal-semiconductor contacts / E. H. Nicollian, A. K. Sinha -- Ion-implanted metal layers / S. M. Myers.".
- catalog description "Includes bibliographies and indexes.".
- catalog extent "x, 578 p. :".
- catalog hasFormat "Thin films.".
- catalog identifier "0471022381".
- catalog isFormatOf "Thin films.".
- catalog isPartOf "The Corrosion monograph series".
- catalog isPartOf "The Electrochemical Society series".
- catalog issued "1978".
- catalog issued "c1978.".
- catalog language "eng".
- catalog publisher "New York : Wiley,".
- catalog relation "Thin films.".
- catalog subject "621.381/71 19".
- catalog subject "QC176.83 .T45".
- catalog subject "Semiconductors.".
- catalog subject "Thin films Interactions".
- catalog subject "Thin films.".
- catalog tableOfContents "An overview / J. M. Poate, K. N. Tu, J. W. Mayer -- Effect of thin film interactions on silicon device technology / R. Rosenberg, M. J. Sullivan, J. K. Howard -- Chemistry and physics of solid-solid interfaces / J. C. Phillips -- The semiconductor-conductor interface / J. O. McCaldin, T. C. McGill -- Thin film deposition and characterization / K. N. Tu, S. S. Lau -- Depth profiling techniques / J. W. Mayer, J. M. Poate -- Grain boundary diffusion / D. Gupta, D. R. Campbell, P. S. Ho -- Electromigration in thin films / F. M. d'Heurle, P. S. Ho -- Metal-metal interdiffusion / J. E. E. Baglin, J. M. Poate -- Silicide formation / K. N. Tu, J. W. Mayer -- Metal-compound semiconductor reactions / A. K. Sinha, J. M. Poate -- Solid phase epitaxy / S. S. Lau, W. F. van der Weg -- Effect of interfacial reactions on the electrical characteristics metal-semiconductor contacts / E. H. Nicollian, A. K. Sinha -- Ion-implanted metal layers / S. M. Myers.".
- catalog title "Thin films : interdiffusion and reactions / edited by J. M. Poate, K. N. Tu, J. W. Mayer ; sponsored by the Electrochemical Society, inc.".
- catalog type "text".