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- catalog abstract "Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.".
- catalog alternative "Particle bombardment.".
- catalog contributor b5806971.
- catalog contributor b5806972.
- catalog created "c1991.".
- catalog date "1991".
- catalog date "c1991.".
- catalog dateCopyrighted "c1991.".
- catalog description "Includes bibliographical references and indexes.".
- catalog description "Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.".
- catalog extent "[xv], 410 p. :".
- catalog identifier "0387534288 (New York)".
- catalog identifier "3540534288 (Berlin)".
- catalog isPartOf "Topics in applied physics ; v. 64".
- catalog issued "1991".
- catalog issued "c1991.".
- catalog language "eng".
- catalog publisher "Berlin ; New York : Springer-Verlag,".
- catalog subject "Particles (Nuclear physics).".
- catalog subject "Physics.".
- catalog subject "Solids Effect on radiation on.".
- catalog subject "Sputtering (Physics)".
- catalog subject "Surfaces (Physics) Effect of radiation on.".
- catalog subject "Surfaces (Physics).".
- catalog title "Particle bombardment.".
- catalog title "Sputtering by particle bombardment III : characteristics of sputtered particles, technical applications / edited by R. Behrisch and K. Wittmaack ; with contributions by R. Behrisch ... [et al.].".
- catalog type "text".