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- catalog contributor b8095353.
- catalog contributor b8095354.
- catalog created "1989.".
- catalog date "1989".
- catalog date "1989.".
- catalog dateCopyrighted "1989.".
- catalog description "Includes bibliographical references and indexes.".
- catalog description "Reactive sputtering -- Plasma oxidation -- The cathodic arc plasma deposition of thin films -- The preparation of substrates for film deposition using glow-discharge techniques.".
- catalog extent "x, 259 p. :".
- catalog identifier "0125330146".
- catalog isPartOf "Physics of thin films ; v.14.".
- catalog issued "1989".
- catalog issued "1989.".
- catalog language "eng".
- catalog publisher "New York : Academic Press,".
- catalog subject "Thin films.".
- catalog tableOfContents "Reactive sputtering -- Plasma oxidation -- The cathodic arc plasma deposition of thin films -- The preparation of substrates for film deposition using glow-discharge techniques.".
- catalog title "Contemporary preparative techniques / edited by Maurice H. Francombe, John L. Vossen.".
- catalog type "text".