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- catalog contributor b8095504.
- catalog contributor b8095505.
- catalog created "1994.".
- catalog date "1994".
- catalog date "1994.".
- catalog dateCopyrighted "1994.".
- catalog description "Design of high-density plasma sources for materials processing - - Electron cyclotron resonance plasma sources and their use in plasma-assisted chemical vapor depositin of thin films -- Unbalanced magnetron sputtering -- The formation of particles in thin-film processing plasmas.".
- catalog description "Includes bibliographical references and indexes.".
- catalog extent "xiii, 397 p. :".
- catalog identifier "0125330189".
- catalog isPartOf "Physics of thin films ; v.18".
- catalog issued "1994".
- catalog issued "1994.".
- catalog language "eng".
- catalog publisher "San Diego, CA. : Academic Press,".
- catalog subject "Thin films.".
- catalog tableOfContents "Design of high-density plasma sources for materials processing - - Electron cyclotron resonance plasma sources and their use in plasma-assisted chemical vapor depositin of thin films -- Unbalanced magnetron sputtering -- The formation of particles in thin-film processing plasmas.".
- catalog title "Plasma sources for thin film deposition and etching / edited by Maurice H. Francombe, John L. Vossen.".
- catalog type "text".