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- catalog contributor b8263511.
- catalog contributor b8263512.
- catalog contributor b8263513.
- catalog contributor b8263514.
- catalog created "c1995.".
- catalog date "1995".
- catalog date "c1995.".
- catalog dateCopyrighted "c1995.".
- catalog description "Includes bibliographic references and author index.".
- catalog extent "xi, 554 p. :".
- catalog identifier "0819418706".
- catalog isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 2512".
- catalog isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2512.".
- catalog issued "1995".
- catalog issued "c1995.".
- catalog language "eng".
- catalog publisher "Bellingham, Wash. : SPIE,".
- catalog subject "621.3815/31 20".
- catalog subject "Integrated circuits Masks Congresses.".
- catalog subject "Microlithography Congresses.".
- catalog subject "TK7872.M3 P47 1995".
- catalog subject "X-ray lithography Congresses.".
- catalog title "Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.].".
- catalog type "text".