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- catalog contributor b9941211.
- catalog contributor b9941212.
- catalog created "1994.".
- catalog date "1994".
- catalog date "1994.".
- catalog dateCopyrighted "1994.".
- catalog description "1. Introduction -- 2. Chemical Vapor Deposition of Aluminum -- 3. Chemical Vapor Deposition of Tungsten -- 4. Chemical Vapor Deposition of Copper from Copper(II) Precursors -- 5. Chemical Vapor Deposition of Copper from Copper(I) Precursors -- 6. Chemical Vapor Deposition of Gold and Silver -- 7. Chemical Vapor Deposition of Platinum, Palladium and Nickel -- 8. Chemical Vapor Deposition of Assorted Metals -- 9. Overview of Metal CVD -- Appendix 1: Examples of Chemical Nomenclature.".
- catalog description "Includes bibliographical references and index.".
- catalog extent "xxiv, 530 p. :".
- catalog identifier "3527290710".
- catalog issued "1994".
- catalog issued "1994.".
- catalog language "eng".
- catalog publisher "Weinheim ; New York : VCH,".
- catalog subject "621.3815/2 20".
- catalog subject "Chemical vapor deposition.".
- catalog subject "Electronic circuit design.".
- catalog subject "Metallic films.".
- catalog subject "TK7867 .C46 1994".
- catalog tableOfContents "1. Introduction -- 2. Chemical Vapor Deposition of Aluminum -- 3. Chemical Vapor Deposition of Tungsten -- 4. Chemical Vapor Deposition of Copper from Copper(II) Precursors -- 5. Chemical Vapor Deposition of Copper from Copper(I) Precursors -- 6. Chemical Vapor Deposition of Gold and Silver -- 7. Chemical Vapor Deposition of Platinum, Palladium and Nickel -- 8. Chemical Vapor Deposition of Assorted Metals -- 9. Overview of Metal CVD -- Appendix 1: Examples of Chemical Nomenclature.".
- catalog title "The chemistry of metal CVD / edited by Toivo T. Kodas and Mark J. Hampden-Smith.".
- catalog type "text".