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- catalog contributor b10376101.
- catalog created "1997.".
- catalog date "1997".
- catalog date "1997.".
- catalog dateCopyrighted "1997.".
- catalog description "Includes bibliographical references and index.".
- catalog description "Materials Research Society Symposium Proceedings -- Gate Electrode Effects on Dielectric Breakdown of SiO[subscript 2] / Akira Toriumi, Yuichiro Mitani and Hideki Satake -- Chloroethane Physisorbed on Hydrogenated Si(111): A Test System for the Evaluation of Core Level XPS Assignment Rules at Si/SiO[subscript 2] Interfaces / F.R. McFeely, K.Z. Zhang and Mark M. Banaszak Holl -- Stabilization of Hydrogen-Free CVD-SiO[subscript 2] Films / Y. Uchida, S. Takei and M. Matsumura -- Electron Induced Depassivation of H and D Terminated Si/SiO[subscript 2] Interfaces / R.A.B. Devine, W.L. Warren and K. Vanheusden [and others] -- Postmetallization Annealing of Ultrathin Remote Plasma-Enhanced CVD Oxides / I.-A. Ragnarsson, P. Lundgren and D. Landheer.".
- catalog extent "440 p. :".
- catalog hasFormat "Amorphous and crystalline insulating thin films--1996.".
- catalog identifier "1558993509".
- catalog isFormatOf "Amorphous and crystalline insulating thin films--1996.".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 446.".
- catalog isPartOf "Materials Research Society symposium proceedings ; v. 446".
- catalog issued "1997".
- catalog issued "1997.".
- catalog language "eng".
- catalog publisher "Pittsburgh, Pa. : Materials Research Society,".
- catalog relation "Amorphous and crystalline insulating thin films--1996.".
- catalog subject "621.3815/2 21".
- catalog subject "Amorphous semiconductors Congresses.".
- catalog subject "Crystal growth Congresses.".
- catalog subject "Dielectric films Congresses.".
- catalog subject "Semiconductor films Congresses.".
- catalog subject "TK7871.15.F5 A45 1997".
- catalog tableOfContents "Materials Research Society Symposium Proceedings -- Gate Electrode Effects on Dielectric Breakdown of SiO[subscript 2] / Akira Toriumi, Yuichiro Mitani and Hideki Satake -- Chloroethane Physisorbed on Hydrogenated Si(111): A Test System for the Evaluation of Core Level XPS Assignment Rules at Si/SiO[subscript 2] Interfaces / F.R. McFeely, K.Z. Zhang and Mark M. Banaszak Holl -- Stabilization of Hydrogen-Free CVD-SiO[subscript 2] Films / Y. Uchida, S. Takei and M. Matsumura -- Electron Induced Depassivation of H and D Terminated Si/SiO[subscript 2] Interfaces / R.A.B. Devine, W.L. Warren and K. Vanheusden [and others] -- Postmetallization Annealing of Ultrathin Remote Plasma-Enhanced CVD Oxides / I.-A. Ragnarsson, P. Lundgren and D. Landheer.".
- catalog title "Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A. / editors, William L. Warren ... [et al.].".
- catalog type "Boston (Mass., 1996) swd".
- catalog type "Conference proceedings. fast".
- catalog type "text".