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catalog contributor b10415653.
catalog contributor b10415654.
catalog created "1997.".
catalog date "1997".
catalog date "1997.".
catalog dateCopyrighted "1997.".
catalog description "An integrated approach for the safe handling of hydrides / J.R. Shealy [and others] -- Plasma etching of silicon dioxide and silicon nitride with nonperfluorocompound chemistries : trifluoroacetic anhydride and iodofluorocarbons / Simon M. Karecki, Laura C. Pruette, and L. Rafael Reif -- Next generation processes and equipment that leads to positive environment, safety, and health impacts / Phyllis Pei and H. Ray Kerby -- Parallel downflow rinse ; water saving technology in water rinse / Y. Hiratsuka and N. Fujikawa -- A technique for measuring slurry-flow dynamics during chemical mechanical polishing / J. Coppeta [and others] -- A plasma reactor for solid waste treatment on PECVD production systems / S. Raoux [and others] -- Measurement of arsenic emission from doped Czochralski silicon crystal growing operation / D. Sinha [and others] -- *Chlorine precursors for gate oxidation processes / M.J. McGeary [and others] -- ".
catalog description "In situ monitoring of HF reprocessing in an industrial scale recirculator bath / A.J. Reddy [and others] -- Anhydrous HF processing as an alternative to HF/water processes / J. Staffa [and others] -- Minimization of DI water consumption in wet clean rinse tanks / J. Cook -- The implementation of dilute chemistries in semiconductor manufacturing / Ron Sanders, Fuyu Lin, and Pat Schay -- *PFC emission control options for plasma processing tools : a current assessment / M.T. Mocella -- Perhalogenated organic byproducts from plasma etching processes and their effects on human health and environmental impact / S. Bauer and I. Wolff -- Environmental issues of perfluorocompounds in the semiconductor industry / Jeffrey D. Williams -- Effectiveness of an inwardly fired burner on abatement of PFCs / A.M. Pierce and J. Van Gompel -- Gas stream analysis and PFC recovery in a semicomductor process / J.A.B. Van Hoeymissen [and others] -- ".
catalog description "Includes bibliographical references and index.".
catalog description "Photoresist polymer mask formed from aqueous phase via polymerization in a two-dimensional surfactant template / P.D. Newman, G.K. Newman, and J.H. Harwell -- An integrated chemical-microbiological approach for the disposal of waste thin-film cadmium telluride photovoltaic modules / K.M. Paknikar [and others] -- Point-of-use silicon sources for CVD / D.A. Saulys [and others] -- Safe precursor gas for broad replacement of SiH₄ in plasma processes employed in integrated circuit production / M.J. Loboda [and others].".
catalog extent "154 p. :".
catalog hasFormat "Environmental, safety, and health issues in IC production.".
catalog identifier "1558993517".
catalog isFormatOf "Environmental, safety, and health issues in IC production.".
catalog isPartOf "Materials Research Society symposia proceedings ; v. 447".
catalog issued "1997".
catalog issued "1997.".
catalog language "eng".
catalog publisher "Pittsburgh, Pa. : Materials Research Society,".
catalog relation "Environmental, safety, and health issues in IC production.".
catalog subject "363.11/9621384134 21".
catalog subject "Green technology Congresses.".
catalog subject "Integrated circuits industry Safety measures Congresses.".
catalog subject "Manufacturing processes Safety measures Congresses.".
catalog subject "Semiconductor industry Safety measures Congresses.".
catalog subject "TK7836 .E58 1997".
catalog tableOfContents "An integrated approach for the safe handling of hydrides / J.R. Shealy [and others] -- Plasma etching of silicon dioxide and silicon nitride with nonperfluorocompound chemistries : trifluoroacetic anhydride and iodofluorocarbons / Simon M. Karecki, Laura C. Pruette, and L. Rafael Reif -- Next generation processes and equipment that leads to positive environment, safety, and health impacts / Phyllis Pei and H. Ray Kerby -- Parallel downflow rinse ; water saving technology in water rinse / Y. Hiratsuka and N. Fujikawa -- A technique for measuring slurry-flow dynamics during chemical mechanical polishing / J. Coppeta [and others] -- A plasma reactor for solid waste treatment on PECVD production systems / S. Raoux [and others] -- Measurement of arsenic emission from doped Czochralski silicon crystal growing operation / D. Sinha [and others] -- *Chlorine precursors for gate oxidation processes / M.J. McGeary [and others] -- ".
catalog tableOfContents "In situ monitoring of HF reprocessing in an industrial scale recirculator bath / A.J. Reddy [and others] -- Anhydrous HF processing as an alternative to HF/water processes / J. Staffa [and others] -- Minimization of DI water consumption in wet clean rinse tanks / J. Cook -- The implementation of dilute chemistries in semiconductor manufacturing / Ron Sanders, Fuyu Lin, and Pat Schay -- *PFC emission control options for plasma processing tools : a current assessment / M.T. Mocella -- Perhalogenated organic byproducts from plasma etching processes and their effects on human health and environmental impact / S. Bauer and I. Wolff -- Environmental issues of perfluorocompounds in the semiconductor industry / Jeffrey D. Williams -- Effectiveness of an inwardly fired burner on abatement of PFCs / A.M. Pierce and J. Van Gompel -- Gas stream analysis and PFC recovery in a semicomductor process / J.A.B. Van Hoeymissen [and others] -- ".
catalog tableOfContents "Photoresist polymer mask formed from aqueous phase via polymerization in a two-dimensional surfactant template / P.D. Newman, G.K. Newman, and J.H. Harwell -- An integrated chemical-microbiological approach for the disposal of waste thin-film cadmium telluride photovoltaic modules / K.M. Paknikar [and others] -- Point-of-use silicon sources for CVD / D.A. Saulys [and others] -- Safe precursor gas for broad replacement of SiH₄ in plasma processes employed in integrated circuit production / M.J. Loboda [and others].".
catalog title "Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A. / editors, Rafael Reif ... [et al.].".
catalog type "Boston (Mass., 1996) swd".
catalog type "Conference proceedings. fast".
catalog type "text".