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- catalog contributor b10495257.
- catalog created "c1997.".
- catalog date "1997".
- catalog date "c1997.".
- catalog dateCopyrighted "c1997.".
- catalog description "Chemically Stable Semiconductor Surface Layers Using Low-Temperature Grown GaAs / D.B. Janes, S. Hong and V.R. Kolagunta [and others] -- Surface Reconstruction and Morphology of Hydrogen Sulfide Treated GaAs(001) Substrate / Jun Suda, Yoichi Kawakami and Shizuo Fujita [and others] -- Improvement of InGaP/GaAs Heterointerface Quality by Controlling AsH[subscript 3] Flow Conditions / Yoshino K. Fukai, Fumiaki Hyuga and Takumi Nittono [and others] -- Processing of InP and GaAs Surfaces by Hydrogen and Oxygen Plasmas: In situ Real-Time Ellipsometric Monitoring / M. Losurdo, P. Capezzuto and G. Bruno -- Characterization of GaAs Surfaces Subjected to A Cl[subscript 2]/Ar High-Density Plasma-Etching Process / C.R. Eddy, Jr., O.J. Glembocki and V.A. Shamamian [et al.].".
- catalog description "Includes bibliographical references and indexes.".
- catalog extent "xiii,505 p. :".
- catalog identifier "1558993525".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 448.".
- catalog isPartOf "Materials Research Society symposium proceedings, 0272-9172 ; v. 448".
- catalog issued "1997".
- catalog issued "c1997.".
- catalog language "eng".
- catalog publisher "Pittsburgh, Pa. : Materials Research Society,".
- catalog subject "621.384/134 21".
- catalog subject "Crystal growth Congresses.".
- catalog subject "QC611.6.S9 C68 1997".
- catalog subject "Semiconductors Junctions Congresses.".
- catalog subject "Semiconductors Surfaces Congresses.".
- catalog subject "Surface chemistry Congresses.".
- catalog tableOfContents "Chemically Stable Semiconductor Surface Layers Using Low-Temperature Grown GaAs / D.B. Janes, S. Hong and V.R. Kolagunta [and others] -- Surface Reconstruction and Morphology of Hydrogen Sulfide Treated GaAs(001) Substrate / Jun Suda, Yoichi Kawakami and Shizuo Fujita [and others] -- Improvement of InGaP/GaAs Heterointerface Quality by Controlling AsH[subscript 3] Flow Conditions / Yoshino K. Fukai, Fumiaki Hyuga and Takumi Nittono [and others] -- Processing of InP and GaAs Surfaces by Hydrogen and Oxygen Plasmas: In situ Real-Time Ellipsometric Monitoring / M. Losurdo, P. Capezzuto and G. Bruno -- Characterization of GaAs Surfaces Subjected to A Cl[subscript 2]/Ar High-Density Plasma-Etching Process / C.R. Eddy, Jr., O.J. Glembocki and V.A. Shamamian [et al.].".
- catalog title "Control of semiconductor surfaces and interfaces : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A. / editors, S.M. Prokes ... [et al.].".
- catalog type "Boston (Mass., 1996) swd".
- catalog type "Conference proceedings. fast".
- catalog type "text".