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- catalog contributor b10526800.
- catalog contributor b10526801.
- catalog contributor b10526802.
- catalog contributor b10526803.
- catalog created "c1997.".
- catalog date "1997".
- catalog date "c1997.".
- catalog dateCopyrighted "c1997.".
- catalog description "Includes bibliographical references and indexes.".
- catalog description "Megasonic irradiation-induced chemical reaction in the solution for silicon wafer cleaning / T. Ohmi [and others] -- Practical considerations in megasonic wafer cleaning / R. Mark Hall, Taura Jarvis, and Thad Parry -- Particulate removal from silicon substrates in megasonic-assisted dilute SC1 chemistry / Ismail Kashkoush [and others] -- Si[subscript 3]N[subscript 4] particle removal efficiency study / Jane Qian Liu [and others] -- Advanced alkali cleaning solution for simplification of semiconductor Cleaning Process / Hitoshi Morinaga [and others].".
- catalog extent "xiii, 545 p. :".
- catalog hasFormat "Science and technology of semiconductor surface preparation.".
- catalog identifier "1558993819".
- catalog isFormatOf "Science and technology of semiconductor surface preparation.".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 477.".
- catalog isPartOf "Materials Research Society symposium proceedings, 0272-9172 ; v. 477".
- catalog issued "1997".
- catalog issued "c1997.".
- catalog language "eng".
- catalog publisher "Pittsburgh, Pa. : Materials Research Society,".
- catalog relation "Science and technology of semiconductor surface preparation.".
- catalog subject "621.3815/2 21".
- catalog subject "Semiconductors Cleaning Congresses.".
- catalog subject "Semiconductors Surfaces Congresses.".
- catalog subject "Surface chemistry Congresses.".
- catalog subject "Surface preparation Congresses.".
- catalog subject "TK7871.85 .S396 1997".
- catalog tableOfContents "Megasonic irradiation-induced chemical reaction in the solution for silicon wafer cleaning / T. Ohmi [and others] -- Practical considerations in megasonic wafer cleaning / R. Mark Hall, Taura Jarvis, and Thad Parry -- Particulate removal from silicon substrates in megasonic-assisted dilute SC1 chemistry / Ismail Kashkoush [and others] -- Si[subscript 3]N[subscript 4] particle removal efficiency study / Jane Qian Liu [and others] -- Advanced alkali cleaning solution for simplification of semiconductor Cleaning Process / Hitoshi Morinaga [and others].".
- catalog title "Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A. / editors, Gregg S. Higashi ... [et al.].".
- catalog type "Conference proceedings. fast".
- catalog type "San Francisco (Calif., 1997) swd".
- catalog type "text".