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- catalog contributor b10607676.
- catalog created "c1997.".
- catalog date "1997".
- catalog date "c1997.".
- catalog dateCopyrighted "c1997.".
- catalog description "Defects and Diffusion Issues for the Manufacturing of Semiconductors in the 21st Century / J.D. Plummer -- Point Defects, Diffusion, and Gettering in Silicon / U. Gosele, D. Conrad and P. Werner [and others] -- Diffusion of Gold into Heavily Boron-Doped Silicon / H. Bracht and A. Rodriguez Schachtrup -- Nonhydrostatic Stress Effects on Boron Diffusion in Si / Michael J. Aziz -- Point Defect Properties From Metal Diffusion Experiments -- What Does the Data Really Tell Us? / Srinivasan Chakravarthi and Scott T. Dunham -- Room-Temperature Migration of Ion-Implanted Baron in Silicon / E.J.H. Collart, K. Weemers and D.J. Gravesteijn [and others].".
- catalog description "Includes bibliographical references and index.".
- catalog extent "xv, 541 p. :".
- catalog identifier "1558993738".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 469.".
- catalog isPartOf "Materials Research Society symposium proceedings, 0272-9172 ; v. 469".
- catalog issued "1997".
- catalog issued "c1997.".
- catalog language "eng".
- catalog publisher "Pittsburg, Pa. : Materials Research Society,".
- catalog subject "621.3815/2 21".
- catalog subject "Semiconductor doping Congresses.".
- catalog subject "Semiconductors Defects Congresses.".
- catalog subject "Silicon crystals Defects Congresses.".
- catalog subject "TK7871.85 .D45453 1997".
- catalog tableOfContents "Defects and Diffusion Issues for the Manufacturing of Semiconductors in the 21st Century / J.D. Plummer -- Point Defects, Diffusion, and Gettering in Silicon / U. Gosele, D. Conrad and P. Werner [and others] -- Diffusion of Gold into Heavily Boron-Doped Silicon / H. Bracht and A. Rodriguez Schachtrup -- Nonhydrostatic Stress Effects on Boron Diffusion in Si / Michael J. Aziz -- Point Defect Properties From Metal Diffusion Experiments -- What Does the Data Really Tell Us? / Srinivasan Chakravarthi and Scott T. Dunham -- Room-Temperature Migration of Ion-Implanted Baron in Silicon / E.J.H. Collart, K. Weemers and D.J. Gravesteijn [and others].".
- catalog title "Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A. / Tomas Diaz de la Rubia ... [et al.].".
- catalog type "Conference proceedings. fast".
- catalog type "San Francisco (Calif., 1997) swd".
- catalog type "text".