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- catalog contributor b10876978.
- catalog contributor b10876979.
- catalog contributor b10876980.
- catalog created "1998.".
- catalog date "1998".
- catalog date "1998.".
- catalog dateCopyrighted "1998.".
- catalog description "Includes bibliographical references and index.".
- catalog description "Real-Time Monitoring of Semiconductor Growth by Spectroscopic Ellipsometry / B. Johs, J. Hale and C. Herzinger [and others] -- In Situ Fourier Transform Infrared Spectroscopy for Real-Time Diagnostics of Thin-Film Processes / P.R. Solomon, S. Charpenay and W. Zhang [et al.] -- Rotating-Compensator Multichannel Ellipsometry: Applications in Process Development for Nanocrystalline Diamond Thin Films / R.W. Collins, Joungchel Lee and P.I. Rovira [et al.] -- SPA Monitoring of GaN MOVPE Surface / Naoki Kobayashi and Yasuyuki Kobayashi -- Material Balance Modeling of End-Point Uniformity in Silicon Dioxide Plasma Etching / J.J. Chambers, K. Min and J.R. Hauser [et al.].".
- catalog extent "ix, 290 p. :".
- catalog hasFormat "In situ process diagnostics and intelligent materials processing.".
- catalog identifier "1558994076".
- catalog isFormatOf "In situ process diagnostics and intelligent materials processing.".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 502.".
- catalog isPartOf "Materials Research Society symposium proceedings ; v. 502".
- catalog issued "1998".
- catalog issued "1998.".
- catalog language "eng".
- catalog publisher "Warrendale, Pa. : Materials Research Society,".
- catalog relation "In situ process diagnostics and intelligent materials processing.".
- catalog subject "621.381 21".
- catalog subject "Electronics Materials Congresses.".
- catalog subject "Lasers Industrial applications Congresses.".
- catalog subject "Manufacturing processes Congresses.".
- catalog subject "Semiconductors Congresses.".
- catalog subject "TK7871 .I55 1998".
- catalog subject "Thin films Congresses.".
- catalog tableOfContents "Real-Time Monitoring of Semiconductor Growth by Spectroscopic Ellipsometry / B. Johs, J. Hale and C. Herzinger [and others] -- In Situ Fourier Transform Infrared Spectroscopy for Real-Time Diagnostics of Thin-Film Processes / P.R. Solomon, S. Charpenay and W. Zhang [et al.] -- Rotating-Compensator Multichannel Ellipsometry: Applications in Process Development for Nanocrystalline Diamond Thin Films / R.W. Collins, Joungchel Lee and P.I. Rovira [et al.] -- SPA Monitoring of GaN MOVPE Surface / Naoki Kobayashi and Yasuyuki Kobayashi -- Material Balance Modeling of End-Point Uniformity in Silicon Dioxide Plasma Etching / J.J. Chambers, K. Min and J.R. Hauser [et al.].".
- catalog title "In situ process diagnostics and intelligent materials processing : symposium held December 2-5, 1997, Boston, Massachusetts, U.S.A. / editors, Peter A. Rosenthal, Walter M. Duncan, John A. Woollam.".
- catalog type "Boston (Mass., 1997) swd".
- catalog type "Conference proceedings. fast".
- catalog type "text".