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catalog contributor b10960016.
catalog contributor b10960017.
catalog contributor b10960018.
catalog contributor b10960019.
catalog created "c1998.".
catalog date "1998".
catalog date "c1998.".
catalog dateCopyrighted "c1998.".
catalog description "Acid labile cross-linked units : a concept for improved positive deep-UV photoresists / H.-T. Schacht, P. Falcigno, N. Münzel, R. Schulz, and A. Medina -- Chemistry of ketal resist system and its lithographic performance / Wu-Song Huang, Kim Y. Lee, Rao Bantu, Ranee Kwong, Ahmad Katnani, Mahmoud Khojasteh, William Brunsvold, Steven Holmes, Ronald Nunes, Tsuyoshi Shibata, George Orsula, James Cameron, Dominic Yang, and Roger Sinta -- Photoacid diffusion in chemically amplified DUV resists / Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, and Kunihiko Kasama -- Highly photosensitive diazo compounds as photoacid generators for chemically amplified resists / Kieko Harada, Masahito Kushida, Kyoichi Saito, Kazuyuki Sugita, and Hirotada Iida -- Exploration of chemically amplified resist mechanisms and performance at small linewidths / James W. Taylor, Paul M. Dentinger, Steven J. Rhyner, and Geoffrey W. Reynolds -- ".
catalog description "Alkali-developable positive-photosensitive polyimide based on diazonaphthoquinone sensitizer / T. Ueno, Y. Okabe, T. Miwa, Y. Maekawa, and G. Rames-Langlade.".
catalog description "Includes bibliographical references and indexes.".
catalog description "Lithography with a pattern of block copolymer microdomains as a positive or negative resist / Christopher Harrison, Miri Park, Paul M. Chaikin, Richard A. Register, and Douglas H. Adamson -- Inorganic nanostructures on surfaces using micellar diblock copolymer templates / Joachim P. Spatz, Thomas Herzog, Stefan Mössmer, Paul Ziemann, and Martin Möller -- Synthesis of stereoregular polymers as precursors to highly conducting carbon for use in applications in micro- and nanolithography / C.B. Gorman, R.W. Vest, J.L. Snover, T.L. Utz, and S.A. Serron -- Metallization on poly(tetrafluoroethylene) substrate by excimer-laser-induced surface reaction and chemical plating / Hiroyuki Niino and Akira Yabe -- An inorganic approach to photolithography : the photolithographic deposition of dielectric metal oxide films / Ross H. Hill and Sharon L. Blair -- Molding of polymeric microstructures / T. Hanemann, V. Piotter, R. Ruprecht, and J.H. Hausselt -- ".
catalog description "Molecular design for new positive electron-beam resists / Yukio Nagasaki -- The influence of structure on dissolution inhibition for novolac-based photoresists : adaption of the probabilistic approach / Christopher L. McAdams, Wang Yueh, Pavlos Tsiartas, Dale Hsieh, and C. Grant Willson -- Photoacid generating polymers for surface modification resists / Masamitsu Shirai, Mitsuho Masuda, Masahiro Tsunooka, Masayuki Endo, and Takahiro Matsuo -- Material design and development for aqueous base compatible high-performance deep UV negative-tone resists / Pushkara Rao Varanasi, Hiroshi Ito, Phil Brock, Gregory Breyta, William R. Brunsvold, and Ahmad D. Katnani -- Advanced chemically amplified resist process using non-ammonia generating adhesion promoter / M. Endo and A. Katsuyama -- Post-exposure bake kinetics in epoxy novolac-based chemically amplified resists / P. Argitis, S. Boyatzis, I. Raptis, N. Glezos, and M. Hatzakis -- ".
catalog description "Synthesis and evaluation of alicyclic backbone polymers for 193 nm lithography / Hiroshi Ito, Norbert Seehof, Rikiya Sato, Tomonari Nakayama, and Mitsuru Ueda -- Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists / Robert D. Allen, Juliann Opitz, Carl E. Larson, Thomas I. Wallow, Richard A. DiPietro, Gregory Breyta, Ratnam Sooriyakumaran, and Donald C. Hofer -- Calixarene and dendrimer as novel photoresist materials / Osamu Haba, Daisuke Takahashi, Kohji Haga, Yoshimasa Sakai, Tomonari Nakayama, and Mitsuru Ueda -- Calixarene resists for nanolithography / Yoshitake Ohnishi, Naoko Wamme, and Jun-ichi Fujita -- Design and preliminary studies of environmentally enhanced water-castable, water-developable positive tone resists : model and feasibility studies / Jennifer M. Havard, Dario Pasini, Jean M.J. Fréchet, David Medeiros, Shintaro Yamada, and C. Grant Willson -- ".
catalog description "The preparation and investigation of macromolecular architectures for microlithography by "living" free radical polymerization / G.G. Barclay, M. King, A. Orellana, P.R.L. Malenfant, R. Sinta, E. Malmstrom, H. Ito, and C.J. Hawker -- Acid proliferation reactions and their application to chemically amplified lithographic imaging / Kunihiro Ichimura, Koji Arimitsu, Soh Noguchi, and Kazuaki Kudo -- Deprotection kinetics of alicyclic polymer resist systems designed for ArF (193 nm) lithography / Uzodinma Okoroanyanwu, Jeffrey D. Byers, Ti Cao, Stephen E. Webber, and C. Grant Willson -- 193 nm single layer resist based on poly(norbornene-alt-maleic anhydride) derivatives : the interplay of the chemical structure of components and lithographic properties / F.M. Houlihan, A. Timko, R. Hutton, R. Cirelli, J.M. Kometani, Elsa Reichmanis, and O. Nalamasu -- ".
catalog extent "xii, 386 p. :".
catalog hasFormat "Micro- and nanopatterning polymers.".
catalog identifier "0841235813".
catalog isFormatOf "Micro- and nanopatterning polymers.".
catalog isPartOf "ACS symposium series, 0097-6156 ; 706".
catalog issued "1998".
catalog issued "c1998.".
catalog language "eng".
catalog publisher "Washington, DC : American Chemical Society ; [New York] : Distributed by Oxford University Press,".
catalog relation "Micro- and nanopatterning polymers.".
catalog subject "621.381 21".
catalog subject "Microelectronics Materials Congresses.".
catalog subject "Microelectronics Materials.".
catalog subject "Photoresists Materials Congresses.".
catalog subject "Photoresists Materials.".
catalog subject "Polymeric composites Congresses.".
catalog subject "Polymeric composites.".
catalog subject "TK7871.15.P6 M517 1998".
catalog tableOfContents "Acid labile cross-linked units : a concept for improved positive deep-UV photoresists / H.-T. Schacht, P. Falcigno, N. Münzel, R. Schulz, and A. Medina -- Chemistry of ketal resist system and its lithographic performance / Wu-Song Huang, Kim Y. Lee, Rao Bantu, Ranee Kwong, Ahmad Katnani, Mahmoud Khojasteh, William Brunsvold, Steven Holmes, Ronald Nunes, Tsuyoshi Shibata, George Orsula, James Cameron, Dominic Yang, and Roger Sinta -- Photoacid diffusion in chemically amplified DUV resists / Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, and Kunihiko Kasama -- Highly photosensitive diazo compounds as photoacid generators for chemically amplified resists / Kieko Harada, Masahito Kushida, Kyoichi Saito, Kazuyuki Sugita, and Hirotada Iida -- Exploration of chemically amplified resist mechanisms and performance at small linewidths / James W. Taylor, Paul M. Dentinger, Steven J. Rhyner, and Geoffrey W. Reynolds -- ".
catalog tableOfContents "Alkali-developable positive-photosensitive polyimide based on diazonaphthoquinone sensitizer / T. Ueno, Y. Okabe, T. Miwa, Y. Maekawa, and G. Rames-Langlade.".
catalog tableOfContents "Lithography with a pattern of block copolymer microdomains as a positive or negative resist / Christopher Harrison, Miri Park, Paul M. Chaikin, Richard A. Register, and Douglas H. Adamson -- Inorganic nanostructures on surfaces using micellar diblock copolymer templates / Joachim P. Spatz, Thomas Herzog, Stefan Mössmer, Paul Ziemann, and Martin Möller -- Synthesis of stereoregular polymers as precursors to highly conducting carbon for use in applications in micro- and nanolithography / C.B. Gorman, R.W. Vest, J.L. Snover, T.L. Utz, and S.A. Serron -- Metallization on poly(tetrafluoroethylene) substrate by excimer-laser-induced surface reaction and chemical plating / Hiroyuki Niino and Akira Yabe -- An inorganic approach to photolithography : the photolithographic deposition of dielectric metal oxide films / Ross H. Hill and Sharon L. Blair -- Molding of polymeric microstructures / T. Hanemann, V. Piotter, R. Ruprecht, and J.H. Hausselt -- ".
catalog tableOfContents "Molecular design for new positive electron-beam resists / Yukio Nagasaki -- The influence of structure on dissolution inhibition for novolac-based photoresists : adaption of the probabilistic approach / Christopher L. McAdams, Wang Yueh, Pavlos Tsiartas, Dale Hsieh, and C. Grant Willson -- Photoacid generating polymers for surface modification resists / Masamitsu Shirai, Mitsuho Masuda, Masahiro Tsunooka, Masayuki Endo, and Takahiro Matsuo -- Material design and development for aqueous base compatible high-performance deep UV negative-tone resists / Pushkara Rao Varanasi, Hiroshi Ito, Phil Brock, Gregory Breyta, William R. Brunsvold, and Ahmad D. Katnani -- Advanced chemically amplified resist process using non-ammonia generating adhesion promoter / M. Endo and A. Katsuyama -- Post-exposure bake kinetics in epoxy novolac-based chemically amplified resists / P. Argitis, S. Boyatzis, I. Raptis, N. Glezos, and M. Hatzakis -- ".
catalog tableOfContents "Synthesis and evaluation of alicyclic backbone polymers for 193 nm lithography / Hiroshi Ito, Norbert Seehof, Rikiya Sato, Tomonari Nakayama, and Mitsuru Ueda -- Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists / Robert D. Allen, Juliann Opitz, Carl E. Larson, Thomas I. Wallow, Richard A. DiPietro, Gregory Breyta, Ratnam Sooriyakumaran, and Donald C. Hofer -- Calixarene and dendrimer as novel photoresist materials / Osamu Haba, Daisuke Takahashi, Kohji Haga, Yoshimasa Sakai, Tomonari Nakayama, and Mitsuru Ueda -- Calixarene resists for nanolithography / Yoshitake Ohnishi, Naoko Wamme, and Jun-ichi Fujita -- Design and preliminary studies of environmentally enhanced water-castable, water-developable positive tone resists : model and feasibility studies / Jennifer M. Havard, Dario Pasini, Jean M.J. Fréchet, David Medeiros, Shintaro Yamada, and C. Grant Willson -- ".
catalog tableOfContents "The preparation and investigation of macromolecular architectures for microlithography by "living" free radical polymerization / G.G. Barclay, M. King, A. Orellana, P.R.L. Malenfant, R. Sinta, E. Malmstrom, H. Ito, and C.J. Hawker -- Acid proliferation reactions and their application to chemically amplified lithographic imaging / Kunihiro Ichimura, Koji Arimitsu, Soh Noguchi, and Kazuaki Kudo -- Deprotection kinetics of alicyclic polymer resist systems designed for ArF (193 nm) lithography / Uzodinma Okoroanyanwu, Jeffrey D. Byers, Ti Cao, Stephen E. Webber, and C. Grant Willson -- 193 nm single layer resist based on poly(norbornene-alt-maleic anhydride) derivatives : the interplay of the chemical structure of components and lithographic properties / F.M. Houlihan, A. Timko, R. Hutton, R. Cirelli, J.M. Kometani, Elsa Reichmanis, and O. Nalamasu -- ".
catalog title "Micro- and nanopatterning polymers / Hiroshi Ito, editor ... [et al.].".
catalog type "Conference proceedings. fast".
catalog type "text".