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- catalog contributor b11014220.
- catalog created "c1998.".
- catalog date "1998".
- catalog date "c1998.".
- catalog dateCopyrighted "c1998.".
- catalog description "Includes bibliographical references and index.".
- catalog description "pt. I. Interconnection frontiers -- pt. II. Aluminum interconnects -- pt. III. Cobalt and other silicides -- pt. IV. Titanium silicide -- pt. V. Mosfet, source, drain and interconnect engineering -- pt. VI. Copper interconnects and barriers -- pt. VII. Poster session: advanced interconnects and contacts -- pt. VIII. Contacts to compound semiconductor devices -- pt. IX. Novel interconnect materials and schemes -- pt. X. Diffusion barriers.".
- catalog extent "xvi, 560 p. :".
- catalog hasFormat "Advanced interconnects and contact materials and processes for future integrated circuits.".
- catalog identifier "1558994203".
- catalog isFormatOf "Advanced interconnects and contact materials and processes for future integrated circuits.".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 514.".
- catalog isPartOf "Materials Research Society symposium proceedings ; v. 514".
- catalog issued "1998".
- catalog issued "c1998.".
- catalog language "eng".
- catalog publisher "Warrendale, Pa. : Materials Research Society,".
- catalog relation "Advanced interconnects and contact materials and processes for future integrated circuits.".
- catalog subject "621.381/046 21".
- catalog subject "Electronic packaging Materials Congresses.".
- catalog subject "Integrated circuits Materials Congresses.".
- catalog subject "Semiconductors Congresses.".
- catalog subject "TK7870.15 .A333 1998".
- catalog tableOfContents "pt. I. Interconnection frontiers -- pt. II. Aluminum interconnects -- pt. III. Cobalt and other silicides -- pt. IV. Titanium silicide -- pt. V. Mosfet, source, drain and interconnect engineering -- pt. VI. Copper interconnects and barriers -- pt. VII. Poster session: advanced interconnects and contacts -- pt. VIII. Contacts to compound semiconductor devices -- pt. IX. Novel interconnect materials and schemes -- pt. X. Diffusion barriers.".
- catalog title "Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A. / editors, Shyam P. Murarka ... [et al.].".
- catalog type "Conference proceedings. fast".
- catalog type "San Francisco (Calif., 1998) swd".
- catalog type "text".