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- catalog contributor b11383763.
- catalog created "1999.".
- catalog date "1999".
- catalog date "1999.".
- catalog dateCopyrighted "1999.".
- catalog description "Includes bibliographical references.".
- catalog description "Low-Temperature Formation of SiO[subscript 2] and High Dielectrics Constant Material for ULSI in the 21st Century / T. Ohmi, K. Sekine and R. Kaihara / [and others] -- Growth of Thin SiO[subscript 2] by "Spike" Rapid Thermal Oxidation / A.T. Fiory -- Ultrathin Silicon Dioxide Formation by Ozone on Ultraflat Si Surface / A. Kurokawa, T. Maeda and K. Sakamoto / [et al.] -- Ultrathin Oxide Film Formation Using Radical Oxygen In a UHV System / K. Watanabe, S. Kimura and T. Tatsumi -- Low Damage Nitridation of Silicon Oxide Surfaces by Remote-Plasma-Excited Nitrogen / Y. Saito and U. Mori -- Ultrathin Gate Oxides With Shallow Nitrogen Implants as Effective Barriers to Boron Diffusion / Y. Ono, Y. Ma and S.-T. Hsu.".
- catalog extent "xvii, 615 p. :".
- catalog hasFormat "Ultrathin SiO₂ and high-K materials for ULSI gate dielectrics.".
- catalog identifier "1558994742".
- catalog isFormatOf "Ultrathin SiO₂ and high-K materials for ULSI gate dielectrics.".
- catalog isPartOf "Material Research Society symposium proceedings ; v. 567".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 567.".
- catalog issued "1999".
- catalog issued "1999.".
- catalog language "eng".
- catalog publisher "Warrendale, PA : Materials Research Society,".
- catalog relation "Ultrathin SiO₂ and high-K materials for ULSI gate dielectrics.".
- catalog subject "621.39/5 21".
- catalog subject "Dielectrics Congresses.".
- catalog subject "Gate array circuits Materials Congresses.".
- catalog subject "Integrated circuits Ultra large scale integration Materials Congresses.".
- catalog subject "Silicon oxide films Congresses.".
- catalog subject "TK7874.76 .U48 1999".
- catalog tableOfContents "Low-Temperature Formation of SiO[subscript 2] and High Dielectrics Constant Material for ULSI in the 21st Century / T. Ohmi, K. Sekine and R. Kaihara / [and others] -- Growth of Thin SiO[subscript 2] by "Spike" Rapid Thermal Oxidation / A.T. Fiory -- Ultrathin Silicon Dioxide Formation by Ozone on Ultraflat Si Surface / A. Kurokawa, T. Maeda and K. Sakamoto / [et al.] -- Ultrathin Oxide Film Formation Using Radical Oxygen In a UHV System / K. Watanabe, S. Kimura and T. Tatsumi -- Low Damage Nitridation of Silicon Oxide Surfaces by Remote-Plasma-Excited Nitrogen / Y. Saito and U. Mori -- Ultrathin Gate Oxides With Shallow Nitrogen Implants as Effective Barriers to Boron Diffusion / Y. Ono, Y. Ma and S.-T. Hsu.".
- catalog title "Ultrathin SiO₂ and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. / editors, H.R. Huff ... [et al.].".
- catalog type "Conference proceedings. fast".
- catalog type "San Francisco (Calif., 1999) swd".
- catalog type "text".