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- catalog abstract ""This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--Jacket.".
- catalog contributor b11459506.
- catalog created "2000.".
- catalog date "2000".
- catalog date "2000.".
- catalog dateCopyrighted "2000.".
- catalog description ""This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--Jacket.".
- catalog description "Ch. 1. Introduction -- Ch. 2. Radiation and Scattering at EUV and Soft X-Ray Wavelengths -- Ch. 3. Wave Propagation and Refractive Index at EUV and Soft X-Ray Wavelengths -- Ch. 4. Multilayer Interference Coatings -- Ch. 5. Synchrotron Radiation -- Ch. 6. Physics of Hot Dense Plasmas -- Ch. 7. Extreme Ultraviolet and Soft X-Ray Lasers -- Ch. 8. Coherence at Short Wavelengths -- Ch. 9. Soft X-Ray Microscopy with Diffractive Optics -- Ch. 10. Extreme Ultraviolet and X-Ray Lithography.".
- catalog description "Includes bibliographical references and index.".
- catalog extent "xvi, 470 p. :".
- catalog identifier "0521652146 (hbk.)".
- catalog issued "2000".
- catalog issued "2000.".
- catalog language "eng".
- catalog publisher "Cambridge ; New York : Cambridge University Press,".
- catalog subject "539.7/222 21".
- catalog subject "Grenz rays.".
- catalog subject "QC482.G68 A88 2000".
- catalog subject "Ultraviolet radiation.".
- catalog tableOfContents "Ch. 1. Introduction -- Ch. 2. Radiation and Scattering at EUV and Soft X-Ray Wavelengths -- Ch. 3. Wave Propagation and Refractive Index at EUV and Soft X-Ray Wavelengths -- Ch. 4. Multilayer Interference Coatings -- Ch. 5. Synchrotron Radiation -- Ch. 6. Physics of Hot Dense Plasmas -- Ch. 7. Extreme Ultraviolet and Soft X-Ray Lasers -- Ch. 8. Coherence at Short Wavelengths -- Ch. 9. Soft X-Ray Microscopy with Diffractive Optics -- Ch. 10. Extreme Ultraviolet and X-Ray Lithography.".
- catalog title "Soft x-rays and extreme ultraviolet radiation : principles and applications / David Attwood.".
- catalog type "text".