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- catalog alternative "Charged particle optics 4".
- catalog alternative "Charged particle optics four".
- catalog contributor b11760749.
- catalog contributor b11760750.
- catalog created "c1999.".
- catalog date "1999".
- catalog date "c1999.".
- catalog dateCopyrighted "c1999.".
- catalog description "Electron-beam lithography -- Field accuracy and resolution assessment -- Electron sources and electron emission -- Abberation analysis and optimization -- Imaging -- Ion optics -- Space charge and discrete coulomb interactions -- Energy filters, analyzers, and curved axis systems.".
- catalog description "Includes bibliographic references and author index.".
- catalog extent "v, 276 p. :".
- catalog identifier "0819432636".
- catalog isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3777.".
- catalog isPartOf "SPIE proceedings series, 0277-786X ; v. 3777".
- catalog issued "1999".
- catalog issued "c1999.".
- catalog language "eng".
- catalog publisher "Bellingham, Wash., USA : SPIE,".
- catalog subject "Electron optics Congresses.".
- catalog subject "Electron optics Industrial applications Congresses.".
- catalog subject "QC793.5.E62 C474 1999".
- catalog tableOfContents "Electron-beam lithography -- Field accuracy and resolution assessment -- Electron sources and electron emission -- Abberation analysis and optimization -- Imaging -- Ion optics -- Space charge and discrete coulomb interactions -- Energy filters, analyzers, and curved axis systems.".
- catalog title "Charged particle optics 4".
- catalog title "Charged particle optics IV : 22-23 July, 1999, Denver, Colorado / Eric Munro, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.".
- catalog title "Charged particle optics four".
- catalog type "Conference proceedings. fast".
- catalog type "Denver (Colo., 1999) swd".
- catalog type "text".