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catalog contributor b11774484.
catalog created "2000.".
catalog date "2000".
catalog date "2000.".
catalog dateCopyrighted "2000.".
catalog description "Advanced Techniques for Sub-100 nm Resolution Lithography and Molecular Electronics -- Ion Projection Lithography for Nano-Patterning / A. Heuberger, W. Bruenger 3 -- Soft X-rays for Deep Sub-100 nm Lithography, With and Without Masks / Henry I. Smith, D.J.D. Carter, J. Ferrera, D. Gil, J. Goodberlet, J.T. Hastings, M.H. Lim, M. Meinhold, R. Menon, E.E. Moon, C.A. Ross, T. Savas, M. Walsh, F. Zhang 11 -- Lithographic Materials Technologies: 193 nm Imaging and Beyond / Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, Allen H. Gabor, Mark O. Neisser, Murrae J. Bowden 23 -- Direct-Write Electron Beam Lithography: History and State of the Art / Dustin W. Carr, Richard C. Tiberio 33 -- Molecular Scale Electronics: Critical Nanolithography Issues of Synthesis and Addressing /".
catalog description "Diffusion and Distribution of Photoacid Generators in Thin Polymer Films / Qinghuang Lin, Marie Angelopoulos, Katherina Babich, David Medeiros, Narayan Sundararajan, Gina Weibel, Christopher Ober 155 -- Photo and Scanning Probe Lithography Using Alkylsilane Self-Assembled Monolayers / H. Sugimura, T. Hanji, O. Takai, K. Fukuda, H. Misawa 163 -- Carbon Dioxide--Dilated Block Copolymer Templates for Nanostructured Materials / Garth D. Brown, James J. Watkins 169 -- Atomic Scale Characterization and Measurement -- A New Purged UV Spectroscopic Ellipsometer to Characterize 157 nm Nanolithographic Materials / Pierre Boher, Jean Philippe Piel, Patrick Evrard, Jean Louis Stehle 177 -- Optical Characterization and Process Control of Top Surface Imaging / Ying-Ying Luo, Craig Stauffer, Carlos Ygartua, Dinh Chu, Clive Hayzelden 183 -- Improved Algorithm to Extract Force-Distance Curves From Scanning Force Microscope Data /".
catalog description "Fabrication of Isolated Nanoparticle Circuitry Via Lensless Optical Tweezing (L.O.T.s) / M.T. Dearing, G.C. Spalding 325 -- Localized Charge Storage in CeO[subscript 2]/Si(111) by Electrostatic Force Microscopy / J.T. Jones, P.M. Bridger, O.J. Marsh, T.C. McGill 331.".
catalog description "Fullerene-Incorporated Nanocomposite Resist System for Nanolithography / T. Ishii, H. Nozawa, E. Kuramochi, T. Tamamura 103 -- Systematic Studies of Fullerene Derivative Electron Beam Resists / A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, E.J. Shelley, D. Philp, J.A. Preece 115 -- Polymer-Inorganic High Contrast and High Sensitivity Resists for Nanolithography / Hengpeng Wu, Jianzhao Wang, Kenneth E. Gonsalves 121 -- New High Resolution Liquid Crystal Electron Beam Resists / A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, M.T. Allen, J.A. Preece, K.D.M. Harris 129 -- Resist Materials Providing Small Line-Edge Roughness / Hideo Namatsu, Toru Yamaguchi, Kenji Kurihara 135 -- A New High Performance CA Resist for E-Beam Lithography / Ranee Kwong, Wu-Song Huang, Wayne Moreau, Robert Lang, Christopher Robinson, David R. Medeiros, Ari Aviram, Richard C. Guarnieri, Marie Angelopoulos 147 --".
catalog description "Includes bibliographical references and index.".
catalog description "S. Huang, E.T. Mickelson, A.M. Rawlett, C.L. Asplund, A.M. Cassell, M. Kozaki, T.P. Burgin, L. Jones II, J.M. Tour, M.L. Myrick, P.G. Van Patten, J. Chen, C-W. Zhou, C.J. Muller, M.R. Deshpande, M.A. Reed, L.A. Bumm, M.T. Cygan, T.D. Dunbar, P.S. Weiss, D.L. Allara 45 -- Epitaxial Growth and Morphology -- Self-Organization of Steps and Domain Boundaries of 7[times]7 Reconstruction on Si(111) / H. Hibino, Y. Homma, T. Ogino 59 -- Structural Evolution During the Initial Epitaxial Growth of Mo on Sapphire / P.A. Ryan, F. Tsui 71 -- Step Bunching During SiGe Growth on Vicinal Si(111) Surfaces / H. Hibino, T. Ogino 77 -- Novel Concepts of Resists for Nanolithography -- Resist Materials and Nanolithography / Elizabeth A. Dobisz 85 -- Anisotropic Organic/Inorganic Resists: A Novel Concept for Electron Proximity Effect Reduction / Lhadi Merhari, Henry H. Li, Kenneth E. Gonsalves 97 --".
catalog description "Steven J. Eppell, Brian A. Todd, Fredy R. Zypman 189 -- Extending the Possibilities of Near-Field Scanning Optical Microscopy for Simultaneous Topographical and Chemical Force Imaging / N. Nagy, M.C. Goh 195 -- Real-Time Observation of Pt-Si Micro-Droplet Migration by Photoelectron Emission Microscopy / W. Yang, H. Ade, R.J. Nemanich 201 -- Second Derivative Ballistic Electron Emission Spectroscopy inm Au/(AlGa)As / M. Kozhevnikov, V. Narayanamurti, D.L. Smith, Yi-Jen Chiu 207 -- Modeling and Atomistic Simulations -- Modeling of Structural and Elastic Properties of In[subscript x]Ga[subscript 1-x]N Alloys / Frank Grosse, Jorg Neugebauer 215 -- Effects of Interface Roughness and Embedded Nanostructures on Device Properties / D.Z-Y. Ting, T.C. McGill, N.Y. Chen, J.N. Wang, R.G. Li, Y.Q. Wang, W.K. Ge, J.N. Schulman 223 -- Cluster Model Study of the Incorporation Process of Excess Arsenic Into Interstitial Positions of the GaAs Lattice /".
catalog description "T. Marek, S. Kunsagi-Mate, H.P. Strunk 233 -- Computer Simulation of Nucleation on Patterned Surfaces / A. Kuronen, L. Nurminen, K. Kaski 239 -- Realization of Detailed Kinetic Models for the Growth of II-VI Compounds Adopting DFT Calculations and Experimental Evidences / Carlo Cavallotti, Valeria Bertani, Maurizio Masi, Sergio Carra 245 -- Effect of Hydrogen Coverage on Silicon Thin Film Growth: Molecular Dynamics Investigation / Shinya Muramatsu, Masatoshi Shimada, Masahiko Hirao 251 -- A Kinetic Monte Carlo Model of Silicon CVD Growth From a Mixed H[subscript 2]/SiH[subscript 4] Gas Source / M. Fearn, M. Sayed, J.H. Jefferson, D.J. Robbins 257 -- Molecular Dynamics Simulations of Solid Phase Epitaxy of Si: Growth Mechanism and Defect Formation / T. Motooka, S. Munetoh, K. Nisihira, K. Moriguchi, A. Shintani 263 -- Multimillion-Atom Simulations of Atomic-Level Surface Stresses and Pressure Distribution on InAs/GaAs Mesas /".
catalog description "Xiaotao Su, Rajiv K. Kalia, Anupam Madhukar, Aiichiro Nakano, Priya Vashishta 269 -- Effects of the Electronic Structure on the Stability of Metallic Superlattices: Semi-Empirical Calculations of the Total Energy / A.M. Mazzone 275 -- Nanodevices and Nanostructures -- Gate Technology Issues for Silicon MOS Nanotransistors / D.M. Tennant, G.L. Timp, L.E. Ocola, M. Green, T. Sorsch, A. Kornblit, F. Klemens, R. Kleiman, D.A. Muller, Y. Kim, W. Timp 283 -- Nanostructure Fabrication Using Electron Beam / Shinji Matsui 293 -- Nanoscale Electron-Beam Processes and Its Application to Nanodevices / Masanori Komuro 305 -- Novel Technique of Nanometer-Size Fabrication by Using Conventional Photolithography / Shingi Hashioka, Hideki Matsumura 313 -- SPM Based Lithography for Nanometer Scale Electrodes Fabrication / A. Notargiacomo, E. Giovine, E. Cianci, V. Foglietti, F. Evangelisti 319 --".
catalog extent "xiii, 340 p. :".
catalog hasFormat "Materials issues and modeling for device nanofabrication.".
catalog identifier "1558994920".
catalog isFormatOf "Materials issues and modeling for device nanofabrication.".
catalog isPartOf "Materials Research Society symposia proceedings ; v. 584.".
catalog isPartOf "Materials Research Society symposium proceedings ; 584".
catalog issued "2000".
catalog issued "2000.".
catalog language "eng".
catalog publisher "Warrendale, Pa. : Materials Research Society,".
catalog relation "Materials issues and modeling for device nanofabrication.".
catalog subject "621.3815 21".
catalog subject "Integrated circuits Design and construction Congresses.".
catalog subject "Integrated circuits Materials Congresses.".
catalog subject "Microlithography Congresses.".
catalog subject "Molecular electronics Congresses.".
catalog subject "Nanotechnology Congresses.".
catalog subject "TK7874 .M3439 2000".
catalog tableOfContents "Advanced Techniques for Sub-100 nm Resolution Lithography and Molecular Electronics -- Ion Projection Lithography for Nano-Patterning / A. Heuberger, W. Bruenger 3 -- Soft X-rays for Deep Sub-100 nm Lithography, With and Without Masks / Henry I. Smith, D.J.D. Carter, J. Ferrera, D. Gil, J. Goodberlet, J.T. Hastings, M.H. Lim, M. Meinhold, R. Menon, E.E. Moon, C.A. Ross, T. Savas, M. Walsh, F. Zhang 11 -- Lithographic Materials Technologies: 193 nm Imaging and Beyond / Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan, Allen H. Gabor, Mark O. Neisser, Murrae J. Bowden 23 -- Direct-Write Electron Beam Lithography: History and State of the Art / Dustin W. Carr, Richard C. Tiberio 33 -- Molecular Scale Electronics: Critical Nanolithography Issues of Synthesis and Addressing /".
catalog tableOfContents "Diffusion and Distribution of Photoacid Generators in Thin Polymer Films / Qinghuang Lin, Marie Angelopoulos, Katherina Babich, David Medeiros, Narayan Sundararajan, Gina Weibel, Christopher Ober 155 -- Photo and Scanning Probe Lithography Using Alkylsilane Self-Assembled Monolayers / H. Sugimura, T. Hanji, O. Takai, K. Fukuda, H. Misawa 163 -- Carbon Dioxide--Dilated Block Copolymer Templates for Nanostructured Materials / Garth D. Brown, James J. Watkins 169 -- Atomic Scale Characterization and Measurement -- A New Purged UV Spectroscopic Ellipsometer to Characterize 157 nm Nanolithographic Materials / Pierre Boher, Jean Philippe Piel, Patrick Evrard, Jean Louis Stehle 177 -- Optical Characterization and Process Control of Top Surface Imaging / Ying-Ying Luo, Craig Stauffer, Carlos Ygartua, Dinh Chu, Clive Hayzelden 183 -- Improved Algorithm to Extract Force-Distance Curves From Scanning Force Microscope Data /".
catalog tableOfContents "Fabrication of Isolated Nanoparticle Circuitry Via Lensless Optical Tweezing (L.O.T.s) / M.T. Dearing, G.C. Spalding 325 -- Localized Charge Storage in CeO[subscript 2]/Si(111) by Electrostatic Force Microscopy / J.T. Jones, P.M. Bridger, O.J. Marsh, T.C. McGill 331.".
catalog tableOfContents "Fullerene-Incorporated Nanocomposite Resist System for Nanolithography / T. Ishii, H. Nozawa, E. Kuramochi, T. Tamamura 103 -- Systematic Studies of Fullerene Derivative Electron Beam Resists / A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, E.J. Shelley, D. Philp, J.A. Preece 115 -- Polymer-Inorganic High Contrast and High Sensitivity Resists for Nanolithography / Hengpeng Wu, Jianzhao Wang, Kenneth E. Gonsalves 121 -- New High Resolution Liquid Crystal Electron Beam Resists / A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, M.T. Allen, J.A. Preece, K.D.M. Harris 129 -- Resist Materials Providing Small Line-Edge Roughness / Hideo Namatsu, Toru Yamaguchi, Kenji Kurihara 135 -- A New High Performance CA Resist for E-Beam Lithography / Ranee Kwong, Wu-Song Huang, Wayne Moreau, Robert Lang, Christopher Robinson, David R. Medeiros, Ari Aviram, Richard C. Guarnieri, Marie Angelopoulos 147 --".
catalog tableOfContents "S. Huang, E.T. Mickelson, A.M. Rawlett, C.L. Asplund, A.M. Cassell, M. Kozaki, T.P. Burgin, L. Jones II, J.M. Tour, M.L. Myrick, P.G. Van Patten, J. Chen, C-W. Zhou, C.J. Muller, M.R. Deshpande, M.A. Reed, L.A. Bumm, M.T. Cygan, T.D. Dunbar, P.S. Weiss, D.L. Allara 45 -- Epitaxial Growth and Morphology -- Self-Organization of Steps and Domain Boundaries of 7[times]7 Reconstruction on Si(111) / H. Hibino, Y. Homma, T. Ogino 59 -- Structural Evolution During the Initial Epitaxial Growth of Mo on Sapphire / P.A. Ryan, F. Tsui 71 -- Step Bunching During SiGe Growth on Vicinal Si(111) Surfaces / H. Hibino, T. Ogino 77 -- Novel Concepts of Resists for Nanolithography -- Resist Materials and Nanolithography / Elizabeth A. Dobisz 85 -- Anisotropic Organic/Inorganic Resists: A Novel Concept for Electron Proximity Effect Reduction / Lhadi Merhari, Henry H. Li, Kenneth E. Gonsalves 97 --".
catalog tableOfContents "Steven J. Eppell, Brian A. Todd, Fredy R. Zypman 189 -- Extending the Possibilities of Near-Field Scanning Optical Microscopy for Simultaneous Topographical and Chemical Force Imaging / N. Nagy, M.C. Goh 195 -- Real-Time Observation of Pt-Si Micro-Droplet Migration by Photoelectron Emission Microscopy / W. Yang, H. Ade, R.J. Nemanich 201 -- Second Derivative Ballistic Electron Emission Spectroscopy inm Au/(AlGa)As / M. Kozhevnikov, V. Narayanamurti, D.L. Smith, Yi-Jen Chiu 207 -- Modeling and Atomistic Simulations -- Modeling of Structural and Elastic Properties of In[subscript x]Ga[subscript 1-x]N Alloys / Frank Grosse, Jorg Neugebauer 215 -- Effects of Interface Roughness and Embedded Nanostructures on Device Properties / D.Z-Y. Ting, T.C. McGill, N.Y. Chen, J.N. Wang, R.G. Li, Y.Q. Wang, W.K. Ge, J.N. Schulman 223 -- Cluster Model Study of the Incorporation Process of Excess Arsenic Into Interstitial Positions of the GaAs Lattice /".
catalog tableOfContents "T. Marek, S. Kunsagi-Mate, H.P. Strunk 233 -- Computer Simulation of Nucleation on Patterned Surfaces / A. Kuronen, L. Nurminen, K. Kaski 239 -- Realization of Detailed Kinetic Models for the Growth of II-VI Compounds Adopting DFT Calculations and Experimental Evidences / Carlo Cavallotti, Valeria Bertani, Maurizio Masi, Sergio Carra 245 -- Effect of Hydrogen Coverage on Silicon Thin Film Growth: Molecular Dynamics Investigation / Shinya Muramatsu, Masatoshi Shimada, Masahiko Hirao 251 -- A Kinetic Monte Carlo Model of Silicon CVD Growth From a Mixed H[subscript 2]/SiH[subscript 4] Gas Source / M. Fearn, M. Sayed, J.H. Jefferson, D.J. Robbins 257 -- Molecular Dynamics Simulations of Solid Phase Epitaxy of Si: Growth Mechanism and Defect Formation / T. Motooka, S. Munetoh, K. Nisihira, K. Moriguchi, A. Shintani 263 -- Multimillion-Atom Simulations of Atomic-Level Surface Stresses and Pressure Distribution on InAs/GaAs Mesas /".
catalog tableOfContents "Xiaotao Su, Rajiv K. Kalia, Anupam Madhukar, Aiichiro Nakano, Priya Vashishta 269 -- Effects of the Electronic Structure on the Stability of Metallic Superlattices: Semi-Empirical Calculations of the Total Energy / A.M. Mazzone 275 -- Nanodevices and Nanostructures -- Gate Technology Issues for Silicon MOS Nanotransistors / D.M. Tennant, G.L. Timp, L.E. Ocola, M. Green, T. Sorsch, A. Kornblit, F. Klemens, R. Kleiman, D.A. Muller, Y. Kim, W. Timp 283 -- Nanostructure Fabrication Using Electron Beam / Shinji Matsui 293 -- Nanoscale Electron-Beam Processes and Its Application to Nanodevices / Masanori Komuro 305 -- Novel Technique of Nanometer-Size Fabrication by Using Conventional Photolithography / Shingi Hashioka, Hideki Matsumura 313 -- SPM Based Lithography for Nanometer Scale Electrodes Fabrication / A. Notargiacomo, E. Giovine, E. Cianci, V. Foglietti, F. Evangelisti 319 --".
catalog title "Materials issues and modeling for device nanofabrication : November 29-December 2, 1999 / editors, Lhadi Merhari ... [et al.].".
catalog type "Boston (Mass., 1999) swd".
catalog type "text".