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- catalog contributor b12108942.
- catalog created "2000.".
- catalog date "2000".
- catalog date "2000.".
- catalog dateCopyrighted "2000.".
- catalog description "Division of Engineering and Applied Sciences.".
- catalog description "Thesis (Ph. D., Division of Engineering and Applied Sciences)--Harvard University, 2000.".
- catalog extent "xii, 190 leaves :".
- catalog issued "2000".
- catalog issued "2000.".
- catalog language "eng".
- catalog subject "Ferroelectric thin films.".
- catalog subject "Silane.".
- catalog subject "Thin films.".
- catalog title "Chemical vapor deposition of Si, SiO₂, Ti and ferroelectric thin films / a thesis presented by Feng Chen.".
- catalog type "text".