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- catalog contributor b12537619.
- catalog contributor b12537620.
- catalog created "c2002.".
- catalog date "2002".
- catalog date "c2002.".
- catalog dateCopyrighted "c2002.".
- catalog description "Advanced Materials and Processes for Nanolithography -- Novel Approaches to Nanopatterning: From Surface Monolayer Initiated Polymerization to Hybrid Organometallic-Organic Bilayers / Clifford L. Henderson, Sean Barstow, Augustin Jeyakumar, Kendra McCoy, Dennis W. Hess, Laren M. Tolbert -- New Photoresists With Photoacid Generator in the Backbone / Hengpeng Wu, Kenneth E. Gonsalves -- Resist Requirements for Electron Projection and Direct Write Nanolithography / Leonidas E. Ocola -- Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication / J.R. Maldonado, M. Angelopoulos, W. Huang, R.L. Brainard, J.M. Guevremont, Z. Tan -- Polyoxometallate Containing Polymeric Materials for Nanolithography and Molecular Devices / N. Glezos, P. Argitis, D. Velessiotis, P. Koutsolelos, C.D. Diakoumakos, A. Tserepi, K. Beltsios -- Nanoline Formation by Using Small-Aggregate Resist and Supercritical Resist Drying / Hideo Namatsu -- All CO[subscript 2]-Processed Fluoropolymer-Containing Photoresist Systems / Devin Flowers, Erik Hoggan, Joseph M. DeSimone, Ruben Carbonell -- Designing Photoresist Systems for Microlithography in Carbon Dioxide / Devin Flowers, Erik Hoggan, Joseph M. DeSimone, Ruben Carbonell -- Lithographic and Non-Lithographic Methods of Nanofabrication -- EUV Lithography: Patterning to the End of the Road / Jonathan L. Cobb, Robert L. Brainard, Donna J. O'Connell, Paul M. Dentinger -- Plasmon Printing--A New Approach to Near-Field Lithography / Pieter G. Kik, Stefan A. Maier, Harry A. Atwater.".
- catalog description "Includes bibliographical references and indexes.".
- catalog extent "xiii, 338 p. :".
- catalog hasFormat "Nanopatterning--from ultralarge-scale integration to biotechnology.".
- catalog identifier "1558996419".
- catalog isFormatOf "Nanopatterning--from ultralarge-scale integration to biotechnology.".
- catalog isPartOf "Materials Research Society symposia proceedings ; v. 705.".
- catalog isPartOf "Materials Research Society symposium proceedings ; v. 705".
- catalog issued "2002".
- catalog issued "c2002.".
- catalog language "eng".
- catalog publisher "Warrendale, Pa. : Materials Research Society,".
- catalog relation "Nanopatterning--from ultralarge-scale integration to biotechnology.".
- catalog subject "Biotechnology Congresses.".
- catalog subject "Integrated circuits Ultra large scale integration Congresses.".
- catalog subject "Microlithography Congresses.".
- catalog subject "Nanostructures Congresses.".
- catalog subject "Nanotechnology Congresses.".
- catalog subject "QC176.8.N35 S962 2001".
- catalog tableOfContents "Advanced Materials and Processes for Nanolithography -- Novel Approaches to Nanopatterning: From Surface Monolayer Initiated Polymerization to Hybrid Organometallic-Organic Bilayers / Clifford L. Henderson, Sean Barstow, Augustin Jeyakumar, Kendra McCoy, Dennis W. Hess, Laren M. Tolbert -- New Photoresists With Photoacid Generator in the Backbone / Hengpeng Wu, Kenneth E. Gonsalves -- Resist Requirements for Electron Projection and Direct Write Nanolithography / Leonidas E. Ocola -- Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication / J.R. Maldonado, M. Angelopoulos, W. Huang, R.L. Brainard, J.M. Guevremont, Z. Tan -- Polyoxometallate Containing Polymeric Materials for Nanolithography and Molecular Devices / N. Glezos, P. Argitis, D. Velessiotis, P. Koutsolelos, C.D. Diakoumakos, A. Tserepi, K. Beltsios -- Nanoline Formation by Using Small-Aggregate Resist and Supercritical Resist Drying / Hideo Namatsu -- All CO[subscript 2]-Processed Fluoropolymer-Containing Photoresist Systems / Devin Flowers, Erik Hoggan, Joseph M. DeSimone, Ruben Carbonell -- Designing Photoresist Systems for Microlithography in Carbon Dioxide / Devin Flowers, Erik Hoggan, Joseph M. DeSimone, Ruben Carbonell -- Lithographic and Non-Lithographic Methods of Nanofabrication -- EUV Lithography: Patterning to the End of the Road / Jonathan L. Cobb, Robert L. Brainard, Donna J. O'Connell, Paul M. Dentinger -- Plasmon Printing--A New Approach to Near-Field Lithography / Pieter G. Kik, Stefan A. Maier, Harry A. Atwater.".
- catalog title "Nanopatterning--from ultralarge-scale integration to biotechnology : symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A. / editors, Lhadi Merhari ... [et al.].".
- catalog type "Conference proceedings. fast".
- catalog type "text".