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- catalog abstract ""The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.".
- catalog contributor b13013733.
- catalog contributor b13013734.
- catalog created "[2002]".
- catalog date "2000".
- catalog date "[2002]".
- catalog dateCopyrighted "[2002]".
- catalog description ""The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.".
- catalog description "Includes bibliographical references (p. 10-11).".
- catalog extent "11 p. :".
- catalog isPartOf "NISTIR ; 6701".
- catalog issued "2000".
- catalog issued "[2002]".
- catalog language "eng".
- catalog publisher "Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology,".
- catalog subject "Interferometry.".
- catalog subject "Optical instruments Testing.".
- catalog subject "Optical measurements.".
- catalog subject "Photolithography.".
- catalog subject "QC411.4 .I57".
- catalog title "Interferometric metrology of photomask blanks [microform] : approaches using 633 nm wavelength / C.J. Evans ... [et al.].".
- catalog type "text".