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- 00101648 contributor B68197.
- 00101648 contributor B68198.
- 00101648 created "c2000.".
- 00101648 date "2000".
- 00101648 date "c2000.".
- 00101648 dateCopyrighted "c2000.".
- 00101648 description "Includes bibliographical references and index.".
- 00101648 extent "ix, 376 p. :".
- 00101648 identifier "1566772532".
- 00101648 isPartOf "Proceedings (Electrochemical Society) ; v. 99-30.".
- 00101648 isPartOf "Proceedings ; v. 99-30".
- 00101648 issued "2000".
- 00101648 issued "c2000.".
- 00101648 language "eng".
- 00101648 publisher "Pennington, NJ : Electrochemical Society,".
- 00101648 subject "621.3815/2 21".
- 00101648 subject "Integrated circuits Design and construction Congresses.".
- 00101648 subject "Plasma etching Congresses.".
- 00101648 subject "Semiconductors Etching Congresses.".
- 00101648 subject "TK7874 .P587 2000".
- 00101648 title "Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium / editor, G.S. Mathad ; assistant editors, D.W. Hess ... [et al.]".
- 00101648 type "text".