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- 00102038 contributor B68450.
- 00102038 contributor B68451.
- 00102038 contributor B68452.
- 00102038 created "c2000.".
- 00102038 date "2000".
- 00102038 date "c2000.".
- 00102038 dateCopyrighted "c2000.".
- 00102038 description "Includes bibliographical references and indexes.".
- 00102038 extent "xiv, 539 p. :".
- 00102038 identifier "1566772672".
- 00102038 isPartOf "Proceedings (Electrochemical Society) ; v. 2000-2.".
- 00102038 isPartOf "Proceedings ; v. 2000-2".
- 00102038 issued "2000".
- 00102038 issued "c2000.".
- 00102038 language "eng".
- 00102038 publisher "Pennington, NJ : Electrochemical Society,".
- 00102038 subject "546/.6832 21".
- 00102038 subject "Dielectrics Surfaces Congresses.".
- 00102038 subject "QC585.75.S55 I58 2000".
- 00102038 subject "Silica Surfaces Congresses.".
- 00102038 subject "Silicon dioxide films Congresses.".
- 00102038 subject "Surface chemistry Congresses.".
- 00102038 subject "Surfaces (Technology) Congresses.".
- 00102038 title "The physics and chemistry of SiO₂ and the Si-SiO₂ interface--4, 2000 : proceedings of the Fourth International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface, Toronto, Canada, May 15-18, 2000 / editors, Hisham Z. Massoud ... [et al.].".
- 00102038 type "text".