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- 00268968 contributor B85248.
- 00268968 contributor B85249.
- 00268968 created "c1999.".
- 00268968 date "1999".
- 00268968 date "c1999.".
- 00268968 dateCopyrighted "c1999.".
- 00268968 description "Includes bibliographical references and author index.".
- 00268968 extent "2 v. (xvii, 864 p.) :".
- 00268968 identifier "0819431508".
- 00268968 isPartOf "Proceedings of SPIE ; v. 3676".
- 00268968 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3676.".
- 00268968 issued "1999".
- 00268968 issued "c1999.".
- 00268968 language "eng".
- 00268968 publisher "Bellingham, Wash. : SPIE,".
- 00268968 subject "621.3815/31 21".
- 00268968 subject "Lithography, Electron beam Congresses.".
- 00268968 subject "Masks (Electronics) Congresses.".
- 00268968 subject "Microlithography Industrial applications Congresses.".
- 00268968 subject "TK7874 .E525 1999".
- 00268968 subject "X-ray lithography Congresses.".
- 00268968 subject "X-rays Industrial applications Congresses.".
- 00268968 title "Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.".
- 00268968 type "text".