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- 00697933 contributor B284078.
- 00697933 contributor B284079.
- 00697933 created "c1999.".
- 00697933 date "1999".
- 00697933 date "c1999.".
- 00697933 dateCopyrighted "c1999.".
- 00697933 description "Includes bibliographical references and author index.".
- 00697933 extent "2 v. (xv, 1052 p.) :".
- 00697933 identifier "0819431516".
- 00697933 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3677.".
- 00697933 isPartOf "SPIE proceedings series ; v. 3677".
- 00697933 issued "1999".
- 00697933 issued "c1999.".
- 00697933 language "eng".
- 00697933 publisher "Bellingham, Wash., USA : SPIE,".
- 00697933 subject "621.3815/31 21".
- 00697933 subject "Integrated circuits Inspection Congresses.".
- 00697933 subject "Integrated circuits Measurement Congresses.".
- 00697933 subject "Microlithography Congresses.".
- 00697933 subject "Process control Congresses.".
- 00697933 subject "TK7874 .M43763 1999".
- 00697933 title "Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California / Bhanwar Singh, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.".
- 00697933 type "text".