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- 00699160 contributor B285503.
- 00699160 contributor B285504.
- 00699160 created "c1999.".
- 00699160 date "1999".
- 00699160 date "c1999.".
- 00699160 dateCopyrighted "c1999.".
- 00699160 description "Includes bibliographical references and index.".
- 00699160 extent "xiii, 628 p. :".
- 00699160 identifier "081943230X".
- 00699160 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3748.".
- 00699160 isPartOf "SPIE proceedings series ; v. 3748".
- 00699160 issued "1999".
- 00699160 issued "c1999.".
- 00699160 language "eng".
- 00699160 publisher "Bellingham, Wash., USA : SPIE,".
- 00699160 subject "621.3815/31 21".
- 00699160 subject "Integrated circuits Masks Congresses.".
- 00699160 subject "Masks (Electronics) Congresses.".
- 00699160 subject "Microlithography Congresses.".
- 00699160 subject "Optoelectronic devices Design and construction Congresses.".
- 00699160 subject "TK7872.M3 P4724 1999".
- 00699160 subject "X-ray lithography Congresses.".
- 00699160 title "Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.].".
- 00699160 type "text".