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- 00703281 contributor B288445.
- 00703281 contributor B288446.
- 00703281 contributor B288447.
- 00703281 created "c1998.".
- 00703281 date "1998".
- 00703281 date "c1998.".
- 00703281 dateCopyrighted "c1998.".
- 00703281 description "Includes bibliographic references and author index.".
- 00703281 extent "xiii, 672 p. :".
- 00703281 identifier "0819430072".
- 00703281 isPartOf "Proceedings of SPIE ; v. 3546".
- 00703281 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3546.".
- 00703281 issued "1998".
- 00703281 issued "c1998.".
- 00703281 language "eng".
- 00703281 publisher "Bellingham, Washington : SPIE,".
- 00703281 subject "621.3815/31 21".
- 00703281 subject "Integrated circuits Masks Congresses.".
- 00703281 subject "Microlithography Congresses.".
- 00703281 subject "TK7874 .S9435 1998".
- 00703281 title "18th Annual Symposium on Photomask Technology and Management : [proceedings] : 16-18 September, 1998, Redwood City, California / Brian J. Grenon, Frank E. Abboud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.".
- 00703281 type "text".