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- 2001022339 contributor B8923441.
- 2001022339 created "2001.".
- 2001022339 date "2001".
- 2001022339 date "2001.".
- 2001022339 dateCopyrighted "2001.".
- 2001022339 description "Includes bibliographical references.".
- 2001022339 extent "vii, 481 p. :".
- 2001022339 identifier "0871707314".
- 2001022339 isPartOf "Surface engineering series ; v. 2".
- 2001022339 issued "2001".
- 2001022339 issued "2001.".
- 2001022339 language "eng".
- 2001022339 publisher "Materials Park, OH : ASM International,".
- 2001022339 subject "671.7/35 21".
- 2001022339 subject "Refractory coating.".
- 2001022339 subject "TS695 .C52 2001".
- 2001022339 subject "Vapor-plating.".
- 2001022339 title "Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan.".
- 2001022339 type "text".