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- 2001086649 contributor B8966282.
- 2001086649 contributor B8966283.
- 2001086649 contributor B8966284.
- 2001086649 created "c2001.".
- 2001086649 date "2001".
- 2001086649 date "c2001.".
- 2001086649 dateCopyrighted "c2001.".
- 2001086649 description "Includes bibliographical references and indexes.".
- 2001086649 extent "viii, 224 p. :".
- 2001086649 identifier "156677294X".
- 2001086649 isPartOf "Proceedings (Electrochemical Society) ; v. 2000-27.".
- 2001086649 isPartOf "Proceedings ; v. 2000-27".
- 2001086649 issued "2001".
- 2001086649 issued "c2001.".
- 2001086649 language "eng".
- 2001086649 publisher "Pennington, NJ : Electrochemical Society,".
- 2001086649 subject "621.3815 22".
- 2001086649 subject "Copper Congresses.".
- 2001086649 subject "Dielectric films Congresses.".
- 2001086649 subject "Electroplating Congresses.".
- 2001086649 subject "Integrated circuits Materials Congresses.".
- 2001086649 subject "TK7874 .S888 2000".
- 2001086649 title "Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics : proceedings of the international symposium / editor, G.S. Mathad ; assistant editors, H.S. Rathore ... [et al.].".
- 2001086649 type "text".