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- 2001273678 contributor B8991010.
- 2001273678 contributor B8991011.
- 2001273678 created "c2000.".
- 2001273678 date "2000".
- 2001273678 date "c2000.".
- 2001273678 dateCopyrighted "c2000.".
- 2001273678 description "Includes bibliographical references and author index.".
- 2001273678 extent "xiv, 938 p. :".
- 2001273678 identifier "081943616X".
- 2001273678 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3998.".
- 2001273678 isPartOf "SPIE proceedings series, 0277-786X ; v. 3998".
- 2001273678 issued "2000".
- 2001273678 issued "c2000.".
- 2001273678 language "eng".
- 2001273678 publisher "Bellingham, Wash. : SPIE,".
- 2001273678 subject "621.3815/31 21".
- 2001273678 subject "Integrated circuits Inspection Congresses.".
- 2001273678 subject "Integrated circuits Measurement Congresses.".
- 2001273678 subject "Microlithography Congresses.".
- 2001273678 subject "Process control Congresses.".
- 2001273678 subject "TK7874 .M47 2000".
- 2001273678 title "Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.".
- 2001273678 type "text".