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- 2001279000 contributor B8997460.
- 2001279000 contributor B8997461.
- 2001279000 created "c2001.".
- 2001279000 date "2001".
- 2001279000 date "c2001.".
- 2001279000 dateCopyrighted "c2001.".
- 2001279000 description "Includes bibliographical references and index.".
- 2001279000 extent "xxv, 876 p. :".
- 2001279000 identifier "0819440302".
- 2001279000 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4344.".
- 2001279000 isPartOf "SPIE proceedings series ; v. 4344".
- 2001279000 issued "2001".
- 2001279000 issued "c2001.".
- 2001279000 language "eng".
- 2001279000 publisher "Bellingham, Wash. : SPIE,".
- 2001279000 subject "621.3815/31 21".
- 2001279000 subject "Integrated circuits Inspection Congresses.".
- 2001279000 subject "Integrated circuits Measurement Congresses.".
- 2001279000 subject "Microlithography Congresses.".
- 2001279000 subject "Process control Congresses.".
- 2001279000 subject "TK7874 .M43763 2001".
- 2001279000 title "Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.".
- 2001279000 type "text".