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- 2001279005 contributor B8997473.
- 2001279005 contributor B8997474.
- 2001279005 created "c2001.".
- 2001279005 date "2001".
- 2001279005 date "c2001.".
- 2001279005 dateCopyrighted "c2001.".
- 2001279005 description "Includes bibliographical references and index.".
- 2001279005 extent "xv, 818 p. :".
- 2001279005 identifier "0819440299".
- 2001279005 isPartOf "Proceedings of SPIE ; v. 4343".
- 2001279005 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 4343.".
- 2001279005 issued "2001".
- 2001279005 issued "c2001.".
- 2001279005 language "eng".
- 2001279005 publisher "Bellingham, Wash. : SPIE,".
- 2001279005 subject "621.3815/31 21".
- 2001279005 subject "Lithography, Electron beam Congresses.".
- 2001279005 subject "Masks (Electronics) Congresses.".
- 2001279005 subject "Microlithography Industrial applications Congresses.".
- 2001279005 subject "TK7874 .E525 2001".
- 2001279005 subject "X-ray lithography Congresses.".
- 2001279005 subject "X-rays Industrial applications Congresses.".
- 2001279005 title "Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.".
- 2001279005 type "text".