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- 2002070662 contributor B9240964.
- 2002070662 created "2002.".
- 2002070662 date "2002".
- 2002070662 date "2002.".
- 2002070662 dateCopyrighted "2002.".
- 2002070662 description "Includes bibliographical references and indexes.".
- 2002070662 extent "xii, 341 p. :".
- 2002070662 identifier "0444510958".
- 2002070662 issued "2002".
- 2002070662 issued "2002.".
- 2002070662 language "eng".
- 2002070662 publisher "Amsterdam ; Boston : Elsevier,".
- 2002070662 subject "621.044 21".
- 2002070662 subject "Low temperature plasmas Industrial applications.".
- 2002070662 subject "TA2020 .A63 2002".
- 2002070662 title "Advances in low temperature rf plasmas : basis for process design / edited by T. Makabe.".
- 2002070662 type "text".